Water

Water

SCHEMBL2490250

CCCCCN.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL28766473 1.00
Water SCHEMBL11169370 0.96 DNM1 (0.93)
Water SCHEMBL9818050 0.96 DNM1 (0.93)
Water SCHEMBL7520503 0.96 DNM1 (0.93)
Hexadecylamine SCHEMBL2426260 0.96 DNM1 (0.93)
Octadecylamine SCHEMBL1785756 0.96 DNM1 (0.93)
Tetradecylamine SCHEMBL238830 0.96 DNM1 (0.93)
Octadecylamine SCHEMBL5274088 0.96 DNM1 (0.93)
Dodecylamine SCHEMBL7359051 0.96 DNM1 (0.93)
Pentadecylamine SCHEMBL356048 0.96 DNM1 (0.93)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 415 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116022813-A Y-type molecular sieve and synthesis method and application thereof 中国石油化工股份有限公司 2023-04-28 CN claimed
EP-4031598-A1 COATING COMPOSITIONS AND METHODS WITH POLYFUNCTIONAL CARBAMATE SALT Swimc LLC (US) 2022-07-27 EP claimed
CN-112591760-B SSZ-16 molecular sieve with new morphology synthesized by Y molecular sieve crystal transformation and method thereof 金华职业技术学院 2022-06-17 CN claimed
WO-2021055195-A1 COATING COMPOSITIONS AND METHODS WITH POLYFUNCTIONAL CARBAMATE SALT SWIMC LLC (US) 2021-03-25 WO claimed
US-10822524-B2 Aqueous compositions of low dishing silica particles for polysilicon polishing ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, I (US) 2020-11-03 US claimed
EP-3347330-B1 IMPROVED UREA AMMONIUM SULPHATE-BASED COMPOSITION AND METHOD FOR THE MANUFACTURE THEREOF YARA INT ASA (NO) 2020-08-19 EP claimed
CN-110483225-A A kind of water phase Suzuki cross-coupling reaction of the palladium chtalyst without additional ligand UNIV SHAANXI NORMAL 2019-11-22 CN claimed
US-20190185714-A1 AQUEOUS COMPOSITIONS OF LOW DISHING SILICA PARTICLES FOR POLYSILICON POLISHING ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2019-06-20 US claimed
CN-109679739-A A kind of lubricating grease and preparation method thereof 中国石油化工股份有限公司 2019-04-26 CN claimed
CN-105820022-B A kind of hydrocarbon dehydrogenation reaction method 中国石油化工股份有限公司 2019-03-08 CN claimed
CN-101578556-A Stripper for coating layer AZ ELECTRONIC MATERIALS USA (US) 2009-11-11 CN claimed
WO-2009089076-A2 PROCESSES FOR THE PREPARATION AND PURIFICATION OF PALIPERIDONE PALMITATE TEVA PHARMACEUTICAL INDUSTRIES LTD. (IL) 2009-07-16 WO claimed
CN-101293950-A Low-temperature-curable polyurethane compositions with uretdione groups, containing polymers based on polyols that carry secondary oh groups DEGUSSA (DE) 2008-10-29 CN claimed
WO-2008081416-A2 STRIPPER FOR COATING LAYER AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-07-10 WO claimed
US-20080161217-A1 Stripper for Coating Layer MERCK PATENT GMBH (DE) 2008-07-03 US claimed
EP-1937738-A1 ONE-COMPONENT POLYURETHANE SYSTEMS THAT ARE DEVOID OF METAL Evonik Degussa GmbH (DE) 2008-07-02 EP claimed
EP-1844084-A1 HIGHLY REACTIVE URETDIONE GROUP-CONTAINING POLYURETHANE COMPOSITIONS BASED ON 1,4-DIISOCYANATO-DICYCLOHEXYL METHANE Degussa GmbH (DE) 2007-10-17 EP claimed
WO-2007045615-A1 ONE-COMPONENT POLYURETHANE SYSTEMS THAT ARE DEVOID OF METAL EVONIK DEGUSSA GMBH (DE) 2007-04-26 WO claimed
CN-1930205-A Method for producing solid highly-reactive polyurethane compositions containing uretdione groups DEGUSSA (DE) 2007-03-14 CN claimed
WO-2006069839-A1 HIGHLY REACTIVE URETDIONE GROUP-CONTAINING POLYURETHANE COMPOSITIONS BASED ON 1,4-DIISOCYANATO-DICYCLOHEXYL METHANE DEGUSSA GMBH (DE) 2006-07-06 WO claimed