SCHEMBL24908562

SCHEMBL24908562

C=C(C)C(=O)OC(c1cc(I)c(O)c(OC)c1)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ APP P05067 1/20 0.40
▸ LMNA P02545 1/20 0.37
▸ AMY1A P0DUB6 3/20 0.33
▸ TRPV1 Q8NER1 2/20 0.32
▸ ABHD6 Q9BV23 1/20 0.32
▸ CA12 O43570 1/20 0.31
▸ CA1 P00915 1/20 0.31
▸ CA2 P00918 1/20 0.31
▸ CA3 P07451 1/20 0.31
▸ PKM P14618 1/20 0.31
▸ CA4 P22748 1/20 0.31
▸ CA6 P23280 1/20 0.31
▸ CA5A P35218 1/20 0.31
▸ CA7 P43166 1/20 0.31
▸ CA9 Q16790 1/20 0.31
▸ CA14 Q9ULX7 1/20 0.31
▸ CA5B Q9Y2D0 1/20 0.31
▸ AKR1C3 P42330 2/20 0.31
▸ AKR1C2 P52895 2/20 0.31
▸ IGF1R P08069 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24908559 0.91 — —
SCHEMBL24106136 0.82 APP (0.44) APPLMNAAMY1ATRPV1CA12
SCHEMBL24908563 0.80 TSHR (0.48) LMNAMEN1CYP3A4TSHRNFKB1
SCHEMBL26862711 0.75 LMNA (0.41) LMNAABHD6MEN1ALDH1A1MAPT
SCHEMBL26862708 0.72 MAPT (0.45) CA1CA2MEN1ALDH1A1MAPT
SCHEMBL24908561 0.72 ESR1 (0.43) LMNAABHD6CA12CA1CA2
SCHEMBL26862498 0.71 CA12 (0.36) LMNACA12CA1CA2CA7
SCHEMBL24110539 0.71 APP (0.48) APPLMNAAMY1ATRPV1CA12
SCHEMBL5091135 0.70 HPGD (0.41) ALDH1A1POLBCYP3A4HPGDMAPK1
SCHEMBL24908564 0.69 SHBG (0.38) LMNACA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023002869-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR PRODUCING RESIN 富士フイルム株式会社 2023-01-26 — — WO disclosed
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