SCHEMBL24944264

SCHEMBL24944264

COc1cccc(/C=C/C(=O)OC2(c3ccccc3)CCNCC2)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.53
FOS P01100 1/20 0.50
JUN P05412 1/20 0.50
MAOB P27338 4/20 0.47
MAOA P21397 2/20 0.47
CYP1A2 P05177 3/20 0.46
CYP2D6 P10635 3/20 0.46
CYP1A1 P04798 2/20 0.46
CYP1B1 Q16678 2/20 0.46
NPC1 O15118 1/20 0.46
LMNA P02545 1/20 0.46
MAPT P10636 1/20 0.46
HPGD P15428 1/20 0.46
NFKB1 P19838 1/20 0.46
RAB9A P51151 1/20 0.46
NFKB2 Q00653 1/20 0.46
RELA Q04206 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
KDM4E B2RXH2 3/20 0.46
ALDH1A1 P00352 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943658 0.87 BCHE (0.50) BCHEMAOBMAOACYP1A2CYP2D6
SCHEMBL24943656 0.86 MAOA (0.41) MAOBMAOALMNAMAPTALDH1A1
SCHEMBL24944274 0.86 AKR1B10 (0.48) MAOBMAOAMMP1MMP2MMP9
SCHEMBL24944237 0.86 LMNA (0.43) BCHEMAOBCYP1A2CYP2D6CYP1B1
SCHEMBL26423808 0.84 MAOB (0.39) BCHEFOSJUNMAOBMAOA
SCHEMBL24943719 0.84 ALDH1A1 (0.52) MAOBCYP1A2CYP1A1CYP1B1NPC1
SCHEMBL24944271 0.84 MAOB (0.49) MAOBMAOACYP1A2CYP2D6CYP1A1
SCHEMBL26478935 0.84 HSD17B3 (0.48) MAOBMAOACYP2D6CYP1B1MAPT
SCHEMBL24944898 0.84 MAPT (0.54) CYP1A2CYP2D6CYP1A1CYP1B1NPC1
SCHEMBL24944878 0.84 JUN (0.51) JUNNPC1LMNAMAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR BCHE 4211/4885FOS 907/4885JUN 1338/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.