SCHEMBL24944306

SCHEMBL24944306

O=C(OC1(c2ccccc2)CCNCC1)c1cc(O)cc(Cl)c1

nearest known ligand 0.42

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TACR1 P25103 5/20 0.42
HCAR1 Q9BXC0 1/20 0.41
OPRM1 P35372 2/20 0.37
SLC6A4 P31645 3/20 0.36
KCNH2 Q12809 3/20 0.36
HDAC1 Q13547 1/20 0.33
PTGDR2 Q9Y5Y4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413410 0.92 TACR1 (0.45) TACR1OPRM1SLC6A4KCNH2HDAC1
SCHEMBL26478657 0.87 OPRM1 (0.39) TACR1OPRM1SLC6A4KCNH2HDAC1
SCHEMBL26478659 0.85 OPRM1 (0.40) TACR1OPRM1SLC6A4KCNH2HDAC1
SCHEMBL26413416 0.85 OPRM1 (0.39) TACR1OPRM1SLC6A4KCNH2HDAC1
SCHEMBL24944622 0.85 KCNA3 (0.42) TACR1OPRM1
SCHEMBL24944312 0.84 RAB9A (0.42) TACR1OPRM1
SCHEMBL24944620 0.83 DRD2 (0.43) TACR1OPRM1SLC6A4HDAC1PTGDR2
SCHEMBL24944870 0.82 NSD2 (0.47) OPRM1
SCHEMBL24944313 0.82 ESR1 (0.42) TACR1OPRM1HDAC1
SCHEMBL24943664 0.81 OPRM1 (0.46) TACR1OPRM1SLC6A4HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR TACR1 2183/4885HCAR1 3076/4885OPRM1 775/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.