SCHEMBL24944622

SCHEMBL24944622

O=C(OC1(c2ccccc2)CCNCC1)c1cccc(Cl)c1

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KCNA3 P22001 1/20 0.42
MAPT P10636 1/20 0.40
KMT2A Q03164 2/20 0.40
KDM4E B2RXH2 2/20 0.40
GAA P10253 2/20 0.40
TP53 P04637 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
PARP1 P09874 1/20 0.39
OPRM1 P35372 1/20 0.39
RAB9A P51151 1/20 0.38
TACR1 P25103 1/20 0.38
CCR2 P41597 1/20 0.38
KCNK3 O14649 1/20 0.38
KCNK9 Q9NPC2 1/20 0.38
MAOB P27338 1/20 0.38
USP2 O75604 1/20 0.38
ALDH1A1 P00352 1/20 0.38
ALOX15 P16050 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413410 0.90 TACR1 (0.45) OPRM1TACR1
SCHEMBL24943664 0.86 OPRM1 (0.46) GAAOPRM1TACR1USP2ALDH1A1
SCHEMBL24943715 0.86 KMO (0.43) MAPTTP53OPRM1USP2ALDH1A1
SCHEMBL24944312 0.86 RAB9A (0.42) KDM4EPARP1OPRM1RAB9ATACR1
SCHEMBL24944620 0.85 DRD2 (0.43) MAPTKMT2AKDM4EGAAOPRM1
SCHEMBL24944306 0.85 TACR1 (0.42) OPRM1TACR1
SCHEMBL24944068 0.85 OPRM1 (0.41) KMT2AOPRM1RAB9AMAOB
SCHEMBL26413634 0.85 GABRD (0.49) MAPTKMT2ASMN1; SMN2PARP1OPRM1
SCHEMBL26413409 0.85 SLC6A2 (0.41) MAPTGAAOPRM1ALDH1A1
SCHEMBL26478634 0.85 GAA (0.45) KMT2AKDM4EGAATP53SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR KCNA3 1917/4885MAPT 2648/4885KMT2A 1033/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.