SCHEMBL24944304

SCHEMBL24944304

COc1cccc(OCCC(=O)OC2(c3ccccc3)CCNCC2)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.43
MTNR1A P48039 1/20 0.42
MTNR1B P49286 1/20 0.42
ALDH1A1 P00352 3/20 0.42
KDM4E B2RXH2 2/20 0.42
TACR1 P25103 1/20 0.42
KMT2A Q03164 1/20 0.42
GAA P10253 1/20 0.40
HTR1A P08908 1/20 0.39
ADRA1D P25100 1/20 0.39
ADRA1A P35348 1/20 0.39
ADRA1B P35368 1/20 0.39
HPGD P15428 1/20 0.39
HRH3 Q9Y5N1 1/20 0.39
TSHR P16473 1/20 0.39
MAPK1 P28482 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
FFAR1 O14842 1/20 0.39
FFAR4 Q5NUL3 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944669 0.89 OPRM1 (0.42) ALDH1A1KMT2AHTR1AADRA1DADRA1A
SCHEMBL26413761 0.85 OPRM1 (0.40) LMNAALDH1A1TACR1TSHROPRM1
SCHEMBL24944676 0.83 L3MBTL1 (0.43) LMNAALDH1A1GAAHPGDTSHR
SCHEMBL26413709 0.82 TACR1 (0.46) ALDH1A1TACR1L3MBTL1
SCHEMBL24943759 0.82 HDAC1 (0.44) ALDH1A1HPGDTDP1L3MBTL1OPRM1
SCHEMBL24944477 0.80 TACR1 (0.53) ALDH1A1TACR1KMT2ATDP1L3MBTL1
SCHEMBL26413476 0.78 ALDH1A1 (0.48) ALDH1A1KMT2AOPRM1MAOB
SCHEMBL24943994 0.78 NPC1 (0.49) LMNAKMT2AHTR1AL3MBTL1OPRM1
SCHEMBL24944598 0.77 OPRM1 (0.51) LMNATACR1OPRM1
SCHEMBL24943997 0.77 ALDH1A1 (0.47) ALDH1A1KMT2AHPGDL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR LMNA 2930/4885MTNR1A 1053/4885MTNR1B 1344/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.