SCHEMBL26413775

SCHEMBL26413775

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(C(=O)c2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.46
USP2 O75604 1/20 0.46
TSHR P16473 1/20 0.46
HSD17B10 Q99714 1/20 0.46
OPRM1 P35372 2/20 0.42
F2 P00734 1/20 0.41
LMNA P02545 1/20 0.41
HDAC1 Q13547 1/20 0.40
SRD5A2 P31213 1/20 0.40
VNN1 O95497 1/20 0.38
ELANE P08246 2/20 0.37
SIGMAR1 Q99720 1/20 0.36
DRD3 P35462 1/20 0.36
TDP1 Q9NUW8 2/20 0.36
ATM Q13315 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
OPRD1 P41143 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943664 0.94 OPRM1 (0.46) ALDH1A1USP2TSHRHSD17B10OPRM1
SCHEMBL24944875 0.92 AKT2 (0.40) ALDH1A1USP2TSHRHSD17B10OPRM1
SCHEMBL24944313 0.89 ESR1 (0.42) ALDH1A1TSHROPRM1F2LMNA
SCHEMBL24943754 0.89 SMN1; SMN2 (0.43) ALDH1A1USP2TSHRHSD17B10OPRM1
SCHEMBL24944620 0.87 DRD2 (0.43) TSHROPRM1HDAC1DRD3L3MBTL1
SCHEMBL24943674 0.87 NPC1 (0.43) ALDH1A1TSHROPRM1F2LMNA
SCHEMBL26413444 0.87 OPRM1 (0.41) OPRM1F2LMNAHDAC1DRD3
SCHEMBL24944081 0.87 OPRM1 (0.44) ALDH1A1OPRM1LMNAHDAC1TDP1
SCHEMBL24944860 0.87 OPRM1 (0.47) OPRM1HDAC1DRD3TDP1L3MBTL1
SCHEMBL26413644 0.87 PARP10 (0.44) TSHRHSD17B10OPRM1F2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALDH1A1 4767/4885USP2 3554/4885TSHR 3385/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.