SCHEMBL24944907

SCHEMBL24944907

CC(C)Oc1ccc(C(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.46
HSP90AA1 P07900 1/20 0.41
PARP10 Q53GL7 1/20 0.41
ALDH1A1 P00352 3/20 0.41
LMNA P02545 2/20 0.40
GAA P10253 2/20 0.40
MEN1 O00255 1/20 0.40
TP53 P04637 1/20 0.40
HPGD P15428 2/20 0.40
TSHR P16473 1/20 0.40
OPRM1 P35372 2/20 0.40
NPC1 O15118 3/20 0.38
RAB9A P51151 3/20 0.38
CHRM5 P08912 1/20 0.37
MBTPS1 Q14703 2/20 0.37
OPRD1 P41143 1/20 0.37
OPRL1 P41146 1/20 0.37
PDCD1 Q15116 1/20 0.37
CD274 Q9NZQ7 1/20 0.37
KLF5 Q13887 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413477 0.86 OPRM1 (0.47) KMT2AALDH1A1MEN1OPRM1NPC1
SCHEMBL24944901 0.85 OPRD1 (0.43) OPRM1OPRD1PDCD1CD274
SCHEMBL24943750 0.85 PARP10 (0.43) PARP10OPRM1SMN1; SMN2
SCHEMBL24943664 0.84 OPRM1 (0.46) ALDH1A1LMNAGAATSHROPRM1
SCHEMBL24944860 0.83 OPRM1 (0.47) KMT2AMEN1OPRM1NPC1RAB9A
SCHEMBL24944081 0.83 OPRM1 (0.44) KMT2AALDH1A1LMNAGAAHPGD
SCHEMBL24943686 0.83 OPRM1 (0.40) ALDH1A1TSHROPRM1OPRD1OPRL1
SCHEMBL24944656 0.83 OPRM1 (0.48) KMT2APARP10ALDH1A1LMNAMEN1
SCHEMBL24944313 0.82 ESR1 (0.42) KMT2AALDH1A1LMNATSHROPRM1
SCHEMBL24943754 0.82 SMN1; SMN2 (0.43) ALDH1A1TP53HPGDTSHROPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR KMT2A 1033/4885HSP90AA1 3590/4885PARP10 3025/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.