SCHEMBL24944624

SCHEMBL24944624

O=C(OC1(c2ccccc2)CCNCC1)c1cccc(O)c1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 2/20 0.39
HPGD P15428 3/20 0.35
HSD17B10 Q99714 2/20 0.35
ALOX15 P16050 1/20 0.35
TDP1 Q9NUW8 2/20 0.34
KDM4E B2RXH2 2/20 0.33
ALDH1A1 P00352 2/20 0.33
LMNA P02545 1/20 0.33
TSHR P16473 1/20 0.33
HTR2A P28223 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
HMGB1 P09429 1/20 0.33
CA4 P22748 1/20 0.33
CA6 P23280 1/20 0.33
CA7 P43166 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CA9 Q16790 1/20 0.33
NAPRT Q6XQN6 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413459 0.92 OPRM1 (0.39) OPRM1HPGDKDM4EALDH1A1LMNA
SCHEMBL24944311 0.91 HPGD (0.44) OPRM1HPGDHSD17B10ALOX15TDP1
SCHEMBL24944854 0.87 HPGD (0.44) OPRM1HPGDHSD17B10KDM4EALDH1A1
SCHEMBL24944315 0.87 G6PD (0.44) OPRM1HPGDHSD17B10ALOX15TDP1
SCHEMBL26413463 0.86 OPRM1 (0.43) OPRM1HTR2ACA12CA1CA2
SCHEMBL24944714 0.86 HNF4A (0.48) OPRM1TSHR
SCHEMBL24944222 0.85 SIGMAR1 (0.42) OPRM1HSD17B10ALOX15KDM4EALDH1A1
SCHEMBL24944934 0.84 LDHA (0.48) OPRM1KDM4ELMNA
SCHEMBL26413433 0.83 GPR35 (0.37) OPRM1HPGDHSD17B10ALOX15TDP1
SCHEMBL24944199 0.83 SERPINE1 (0.46) OPRM1HPGDHSD17B10ALOX15TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885HPGD 4346/4885HSD17B10 4557/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.