SCHEMBL26479260

SCHEMBL26479260

O=C(OC1(c2ccccc2)CCNCC1)c1cc2ccccc2c(Br)c1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 1/20 0.39
GRIN2A Q12879 1/20 0.39
GRIN2B Q13224 1/20 0.39
GRIN2C Q14957 1/20 0.39
CYP2D6 P10635 1/20 0.36
MEN1 O00255 4/20 0.35
KMT2A Q03164 4/20 0.35
MAPT P10636 2/20 0.35
OPRM1 P35372 2/20 0.34
POLB P06746 2/20 0.34
GPR35 Q9HC97 1/20 0.34
RXFP1 Q9HBX9 1/20 0.34
PLAU P00749 1/20 0.33
ROCK2 O75116 1/20 0.32
PTPN1 P18031 1/20 0.32
KDM4E B2RXH2 3/20 0.32
TACR1 P25103 1/20 0.31
HDAC1 Q13547 1/20 0.31
DRD3 P35462 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26479283 0.90 GRIN2A (0.42) GRIN2DGRIN2AGRIN2BGRIN2CMEN1
SCHEMBL26479242 0.85 OPRM1 (0.36) MAPTOPRM1POLBRXFP1HDAC1
SCHEMBL24944880 0.81 THRB (0.48) MEN1KMT2AMAPTOPRM1POLB
SCHEMBL24944934 0.81 LDHA (0.48) MEN1KMT2AMAPTOPRM1KDM4E
SCHEMBL24944936 0.81 SMN1; SMN2 (0.40) MEN1KMT2AMAPTOPRM1KDM4E
SCHEMBL26478674 0.81 HSPD1 (0.43) MEN1KMT2AMAPTOPRM1PTPN1
SCHEMBL24943765 0.80 KDM4E (0.44) MEN1KMT2AMAPTOPRM1ROCK2
SCHEMBL24944294 0.80 NR4A1 (0.44) MEN1KMT2AMAPTOPRM1POLB
SCHEMBL24943764 0.79 KDM4E (0.43) MEN1KMT2AMAPTOPRM1ROCK2
SCHEMBL24943705 0.79 CDC25B (0.37) MEN1KMT2AOPRM1POLBRXFP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR GRIN2D 659/4885GRIN2A 904/4885GRIN2B 757/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.