Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARA | Q07869 | 14/20 | 0.47 |
| ▸ | PPARG | P37231 | 12/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.36 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.36 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25006129 | 0.90 | PPARA (0.42) | PPARAPPARGCYP1A2GAACYP2C9 | |
| SCHEMBL25006154 | 0.89 | CYP1A2 (0.44) | PPARAPPARGCYP1A2GAACYP2C9 | |
| SCHEMBL24996361 | 0.81 | PPARA (0.34) | PPARAPPARGCYP1A2GAACYP2C9 | |
| SCHEMBL21794264 | 0.77 | TSHR (0.46) | PTGS2 | |
| SCHEMBL24995338 | 0.77 | ERN1 (0.36) | PPARAPPARGCYP1A2GAACYP2C9 | |
| SCHEMBL24996358 | 0.76 | CYP1A2 (0.34) | PPARAPPARGCYP1A2GAACYP2C9 | |
| SCHEMBL23208306 | 0.72 | ALDH1A1 (0.53) | PPARAPPARGMAPT | |
| SCHEMBL24995597 | 0.71 | PPARG (0.38) | PPARAPPARGCYP2C19PTGS2HSP90AA1 | |
| Bicarbonate SCHEMBL3270191 | 0.71 | GAA (0.52) | CYP1A2GAACYP2C9PKMCYP2C19 | |
| SCHEMBL542873 | 0.71 | KDM4E (0.50) | CYP1A2GAACYP2C9PKMCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230038825-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK | FUJIFILM CORPORATION (JP) | 2023-02-09 | — | — | US | disclosed |