Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | MAP4K4 | O95819 | 2/20 | 0.31 |
| ▸ | PPARG | P37231 | 4/20 | 0.31 |
| ▸ | PPARA | Q07869 | 4/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25006154 | 0.86 | CYP1A2 (0.44) | CYP1A2GAACYP2C9PKMCYP2C19 | |
| SCHEMBL25005778 | 0.76 | PPARA (0.47) | CYP1A2GAACYP2C9PKMCYP2C19 | |
| SCHEMBL24995338 | 0.76 | ERN1 (0.36) | CYP1A2GAACYP2C9PKMCYP2C19 | |
| SCHEMBL24995588 | 0.68 | KIF11 (0.44) | PPARGPPARA | |
| SCHEMBL25006129 | 0.67 | PPARA (0.42) | CYP1A2GAACYP2C9PKMCYP2C19 | |
| SCHEMBL21794265 | 0.67 | PTPN1 (0.47) | MAPT | |
| SCHEMBL21794146 | 0.66 | SMN1; SMN2 (0.50) | CYP1A2CYP2C9CYP2C19MAP4K4 | |
| SCHEMBL23432887 | 0.65 | PRKAB2 (0.34) | CYP1A2GAACYP2C9PKMCYP2C19 | |
| SCHEMBL24581546 | 0.65 | EGFR (0.47) | GAAMAPT | |
| SCHEMBL21794139 | 0.64 | MMP3 (0.52) | MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4130878-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK | FUJIFILM Corporation (JP) | 2023-02-08 | — | — | EP | disclosed |