SCHEMBL25006154

SCHEMBL25006154

CC(Oc1ccccc1)Oc1ccc(-c2cc(-c3ccc(OC(C)Oc4ccccc4)cc3)c(S(=O)(=O)O)c(-c3ccc(OC(C)Oc4ccccc4)cc3)c2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 1/20 0.44
▸ GAA P10253 1/20 0.44
▸ CYP2C9 P11712 1/20 0.44
▸ PKM P14618 1/20 0.44
▸ CYP2C19 P33261 1/20 0.44
▸ MCL1 Q07820 2/20 0.40
▸ PPARA Q07869 8/20 0.39
▸ PPARG P37231 7/20 0.39
▸ MAPT P10636 1/20 0.37
▸ GSTP1 P09211 1/20 0.37
▸ CA1 P00915 1/20 0.37
▸ CA2 P00918 1/20 0.37
▸ CA9 Q16790 1/20 0.37
▸ ADAMTS4 O75173 1/20 0.37
▸ RXRA P19793 1/20 0.37
▸ RXRB P28702 1/20 0.37
▸ MAP4K4 O95819 2/20 0.36
▸ ACACB O00763 1/20 0.35
▸ ACACA Q13085 1/20 0.35
▸ ALOX15 P16050 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25005778 0.89 PPARA (0.47) CYP1A2GAACYP2C9PKMCYP2C19
SCHEMBL24995338 0.89 ERN1 (0.36) CYP1A2GAACYP2C9PKMCYP2C19
SCHEMBL24996358 0.86 CYP1A2 (0.34) CYP1A2GAACYP2C9PKMCYP2C19
SCHEMBL24995588 0.80 KIF11 (0.44) PPARAPPARGCA1CA2CA9
SCHEMBL25006129 0.78 PPARA (0.42) CYP1A2GAACYP2C9PKMCYP2C19
SCHEMBL21794265 0.78 PTPN1 (0.47) MAPTCA1CA2CA9
SCHEMBL21794146 0.77 SMN1; SMN2 (0.50) CYP1A2CYP2C9CYP2C19CA1CA2
SCHEMBL24581546 0.76 EGFR (0.47) GAAMAPTGSTP1CA1CA2
SCHEMBL23432887 0.76 PRKAB2 (0.34) CYP1A2GAACYP2C9PKMCYP2C19
SCHEMBL21794139 0.74 MMP3 (0.52) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230038825-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK FUJIFILM CORPORATION (JP) 2023-02-09 — — US disclosed
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