Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | RBP4 | P02753 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2536300 | 0.87 | HSD11B1 (0.34) | PKML3MBTL1GAA | |
| SCHEMBL5004820 | 0.87 | ALDH1A1 (0.33) | ALDH1A1RBP4MEN1KMT2A | |
| SCHEMBL6229112 | 0.86 | MEN1 (0.37) | PKML3MBTL1GAAALDH1A1SMN1; SMN2 | |
| SCHEMBL1772267 | 0.79 | L3MBTL1 (0.39) | PKML3MBTL1GAAALDH1A1SMN1; SMN2 | |
| SCHEMBL2939176 | 0.77 | GLA (0.35) | GAAALDH1A1LMNAMEN1KMT2A | |
| SCHEMBL282760 | 0.74 | PKM (0.42) | PKML3MBTL1GAAALDH1A1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL4580832 | 0.72 | PKM (0.46) | PKML3MBTL1GAAALDH1A1SMN1; SMN2 | |
| SCHEMBL164232 | 0.70 | L3MBTL1 (0.58) | PKML3MBTL1GAAALDH1A1SMN1; SMN2 | |
| SCHEMBL13589980 | 0.70 | L3MBTL1 (0.58) | PKML3MBTL1GAAALDH1A1SMN1; SMN2 | |
| SCHEMBL14493665 | 0.70 | L3MBTL1 (0.58) | PKML3MBTL1GAAALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8440384-B2 | Compound, salt, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-05-14 | — | — | US | disclosed |
| US-20130045446-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND | JSR CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |
| US-8043786-B2 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2011-10-25 | — | — | US | disclosed |
| EP-1586594-B1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2010-09-15 | — | — | EP | disclosed |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-7452655-B2 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-11-18 | — | — | US | disclosed |
| US-7217492-B2 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| US-20060074139-A1 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| EP-1600437-A1 | ACID GENERATORS, SULFONIC ACIDS, SULFONYL HALIDES, AND RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-11-30 | — | — | EP | disclosed |
| US-20050053861-A1 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-03-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | AFF1, RER1, AFF4 | PKM 4428/4885L3MBTL1 2200/4885GAA 4786/4885 |
| US-20130045446-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND | RAD51, RER1, SEM1 | PKM 4309/4885L3MBTL1 2474/4885GAA 2109/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.