Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | PER2 | O15055 | 1/20 | 0.31 |
| ▸ | CRY1 | Q16526 | 1/20 | 0.31 |
| ▸ | CRY2 | Q49AN0 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | CNR1 | P21554 | 1/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29429148 | 0.87 | SLC2A1 (0.36) | SLC2A1MEN1KMT2AALDH1A1LMNA | |
| SCHEMBL447052 | 0.87 | SLC2A1 (0.36) | SLC2A1MEN1KMT2AALDH1A1LMNA | |
| Trifluoromethanesulfonic Acid SCHEMBL36280 | 0.82 | SLC2A1 (0.42) | SLC2A1MEN1KMT2AALDH1A1LMNA | |
| Trifluoromethanesulfonic Acid SCHEMBL29354733 | 0.82 | SLC2A1 (0.42) | SLC2A1MEN1KMT2AALDH1A1LMNA | |
| SCHEMBL5866201 | 0.79 | ALDH1A1 (0.39) | MEN1KMT2AALDH1A1LMNARECQL | |
| SCHEMBL7101055 | 0.78 | BRD4 (0.34) | PER2CRY1CRY2 | |
| Trifluoromethanesulfonic Acid SCHEMBL703652 | 0.77 | KMT2A (0.42) | SLC2A1MEN1KMT2AALDH1A1LMNA | |
| SCHEMBL190939 | 0.77 | SLC2A1 (0.38) | SLC2A1MEN1KMT2AALDH1A1LMNA | |
| SCHEMBL29754149 | 0.77 | SLC2A1 (0.38) | SLC2A1MEN1KMT2AALDH1A1LMNA | |
| SCHEMBL2893210 | 0.77 | CNR2 (0.34) | SLC2A1MEN1KMT2AALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9122154-B2 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9104102-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-08-11 | — | — | US | disclosed |
| US-8889335-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889336-B2 | Radiation-sensitive resin composition and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-20140154625-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2014-06-05 | — | — | US | disclosed |
| US-8722306-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-05-13 | — | — | US | disclosed |
| US-20130295505-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20130260316-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130183624-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-07-18 | — | — | US | disclosed |
| US-20130095428-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-04-18 | — | — | US | disclosed |
| US-20130045446-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND | JSR CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |
| US-20120295198-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-8043786-B2 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20100178608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| EP-1600437-A1 | ACID GENERATORS, SULFONIC ACIDS, SULFONYL HALIDES, AND RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-11-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130045446-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND | RAD51, RER1, SEM1 | SLC2A1 3894/4885MEN1 2122/4885KMT2A 3600/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.