SCHEMBL25596252

SCHEMBL25596252

CCC(C)c1c(C)cc(C(C)(O)C(F)(F)F)cc1C

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
RORC P51449 1/20 0.37
HSD11B1 P28845 16/20 0.36
MLYCD O95822 2/20 0.32
VDR P11473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25596999 0.84 NR1H2 (0.41) MLYCD
SCHEMBL1626491 0.81 RORC (0.38) RORCHSD11B1MLYCD
SCHEMBL17612228 0.76 RORC (0.34) RORCHSD11B1
SCHEMBL2735047 0.76 MLYCD (0.37) RORCMLYCD
SCHEMBL97572 0.74 HSD11B1 (0.43) RORCHSD11B1
SCHEMBL16018022 0.73 CYP3A4 (0.42) RORC
SCHEMBL12753476 0.72 HDAC4 (0.46) RORCHSD11B1
SCHEMBL17286709 0.71 ESR1 (0.45) HSD11B1
SCHEMBL8732505 0.71 NR3C1 (0.36)
SCHEMBL14826048 0.70 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681224-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 US disclosed