SCHEMBL25633247

SCHEMBL25633247

CCC(C)C(=O)OCC(CC)(COC(=O)C(O)(C(F)(F)F)C(F)(F)F)COC(=O)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15134088 0.86 HTT (0.31) HTT
SCHEMBL15134087 0.86 LMNA (0.31) HTT
SCHEMBL8218550 0.83 THRB (0.38) HTT
SCHEMBL14617263 0.81 POLB (0.31) POLBNPSR1
SCHEMBL24436707 0.79 ALDH1A1 (0.35) POLBNPSR1
SCHEMBL25739882 0.77
SCHEMBL8216735 0.76 MAPK1 (0.33) HTT
SCHEMBL10135152 0.75 HTT (0.36) HTT
SCHEMBL18872176 0.75 HTT (0.36) HTT
SCHEMBL14827780 0.74 POLB (0.31) POLBNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed