SCHEMBL2572166

SCHEMBL2572166

CCOC(C)N(c1ccccc1)C(C)OCC

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.40
TP53 P04637 2/20 0.39
ALDH1A1 P00352 4/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
LMNA P02545 2/20 0.38
TSHR P16473 2/20 0.35
GLA P06280 1/20 0.35
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35
SIGMAR1 Q99720 1/20 0.34
MAPT P10636 2/20 0.34
HTT P42858 2/20 0.34
KDM4E B2RXH2 1/20 0.34
ALOX12 P18054 1/20 0.34
NPC1 O15118 1/20 0.33
JAK2 O60674 1/20 0.33
RAB9A P51151 1/20 0.33
PAX8 Q06710 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28590655 0.84 L3MBTL1 (0.33) L3MBTL1TP53ALDH1A1SMN1; SMN2LMNA
SCHEMBL10528993 0.82 LTA4H (0.43) L3MBTL1ALDH1A1TSHRMAPTHTT
SCHEMBL4352608 0.82 ALDH1A1 (0.38) ALDH1A1LMNATSHRRAB9A
SCHEMBL1637983 0.82 L3MBTL1 (0.39) L3MBTL1TP53ALDH1A1SMN1; SMN2LMNA
SCHEMBL10472027 0.80 TP53 (0.38) L3MBTL1TP53ALDH1A1SMN1; SMN2LMNA
SCHEMBL6028468 0.80 SMN1; SMN2 (0.40) L3MBTL1TP53ALDH1A1SMN1; SMN2LMNA
SCHEMBL10524519 0.80 LTA4H (0.42) TP53ALDH1A1SMN1; SMN2LMNATSHR
SCHEMBL11864912 0.79 ALDH1A1 (0.42) TP53ALDH1A1SMN1; SMN2LMNATSHR
SCHEMBL11868100 0.79 ALDH1A1 (0.39) L3MBTL1TP53ALDH1A1SMN1; SMN2LMNA
SCHEMBL10528925 0.77 MEN1 (0.44) TP53ALDH1A1SMN1; SMN2LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1906238-B1 Photosensitive composition and pattern forming method using the same FUJIFILM CORP (JP) 2011-11-09 EP disclosed
US-7824836-B2 Photosensitive composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-11-02 US disclosed
US-20080274421-A1 PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-11-06 US disclosed
EP-1906238-A2 Photosensitive composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
US-4997918-A Benzthiazolium azo dyes CIBA-GEIGY CORPORATION (US) 1991-03-05 US disclosed
US-4845235-A Pyrroline derivative NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1989-07-04 US disclosed
EP-0105031-B1 CATIONIC AZO DYESTUFFS CIBA-GEIGY AG (CH) 1989-01-04 EP disclosed
EP-0105031-A2 Cationic azo dyestuffs CIBA-GEIGY AG (CH) 1984-04-04 EP disclosed