SCHEMBL25836655

SCHEMBL25836655

O=COc1ccc(C(F)(F)F)cc1O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
PTGS1 P23219 1/20 0.40
NQO2 P16083 1/20 0.39
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 3/20 0.37
CYP2C19 P33261 2/20 0.37
HPGD P15428 2/20 0.37
HSD17B10 Q99714 2/20 0.37
USP2 O75604 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2C9 P11712 1/20 0.37
PTGDR2 Q9Y5Y4 1/20 0.37
CES2 O00748 2/20 0.37
MAPT P10636 2/20 0.37
POLB P06746 1/20 0.37
CXCL12 P48061 1/20 0.36
AOX1 Q06278 1/20 0.36
RXRA P19793 1/20 0.35
RXRB P28702 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1998118 0.76 CES2 (0.46) PTGS1ALDH1A1KDM4ECYP2C19HPGD
SCHEMBL1331644 0.76 L3MBTL1 (0.47) MEN1KMT2AALDH1A1CYP1A2MAPT
SCHEMBL10193649 0.76 MEN1 (0.41) MEN1KMT2APTGS1NQO2ALDH1A1
SCHEMBL1758894 0.75 CYP2C19 (0.41) ALDH1A1KDM4ECYP2C19HPGDHSD17B10
SCHEMBL187016 0.75 KDM4E (0.47) MEN1KMT2AALDH1A1KDM4ECYP2C19
SCHEMBL16418462 0.75 ALDH1A1 (0.41) MEN1KMT2APTGS1ALDH1A1KDM4E
SCHEMBL28281433 0.75 MASP2 (0.56) MEN1KMT2AALDH1A1HPGDMAPT
SCHEMBL24436827 0.74 KDM4E (0.62) MEN1KMT2AALDH1A1KDM4ECYP2C19
SCHEMBL13184020 0.73 ESR1 (0.41) MEN1KMT2ANQO2ALDH1A1HPGD
SCHEMBL30705412 0.73 MGLL (0.39) MEN1KMT2APTGS1NQO2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11703758-B2 Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-18 US disclosed