SCHEMBL2584263

SCHEMBL2584263

C=C(C)C(=O)O[Si](Oc1ccccc1)(Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.47
MTNR1A P48039 3/20 0.39
MTNR1B P49286 3/20 0.39
PAX8 Q06710 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.38
ALDH1A1 P00352 4/20 0.37
KDM4E B2RXH2 1/20 0.37
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ALOX15 P16050 1/20 0.34
MAPT P10636 3/20 0.34
HPGD P15428 1/20 0.34
ATM Q13315 2/20 0.34
KMT2A Q03164 1/20 0.34
TSPO P30536 1/20 0.33
GPR174 Q9BXC1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18918451 0.82 PAX8 (0.42) ELANEMTNR1AMTNR1BPAX8L3MBTL1
SCHEMBL25263655 0.82 MTNR1A (0.44) ELANEMTNR1AMTNR1BL3MBTL1ALDH1A1
SCHEMBL1781735 0.80 ELANE (0.41) ELANEMTNR1AMTNR1BPAX8L3MBTL1
SCHEMBL27648804 0.80 ALOX15 (0.43) ELANEMTNR1AMTNR1BL3MBTL1ALDH1A1
SCHEMBL3294457 0.79 PAX8 (0.42) ELANEMTNR1AMTNR1BPAX8L3MBTL1
SCHEMBL230456 0.77 ELANE (0.38) ELANEMTNR1AMTNR1BPAX8L3MBTL1
SCHEMBL230780 0.77 TDP1 (0.49) ELANEMTNR1AMTNR1BL3MBTL1ALDH1A1
SCHEMBL15058 0.76 ELANE (0.73) ELANEL3MBTL1ALDH1A1KDM4ETDP1
SCHEMBL87437 0.76 ELANE (0.73) ELANEL3MBTL1ALDH1A1KDM4ETDP1
Benzene SCHEMBL27862765 0.76 ELANE (0.73) ELANEL3MBTL1ALDH1A1KDM4ETDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9946158-B2 Composition for forming resist underlayer film for nanoimprint NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-04-17 US disclosed
EP-2461350-B1 USE OF A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2018-02-28 EP disclosed
US-20150099070-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT NISSAN CHEMICAL IND LTD (JP) 2015-04-09 US disclosed
EP-2461350-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2012-06-06 EP disclosed
US-20120128891-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-05-24 US disclosed
US-8048615-B2 Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-11-01 US disclosed
US-20090162782-A1 Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-06-25 US disclosed
EP-1972998-A1 SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM Nissan Chemical Industries, Ltd. (JP) 2008-09-24 EP disclosed