Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAS1R3 | Q7RTX0 | 6/20 | 0.36 |
| ▸ | TAS1R1 | Q7RTX1 | 6/20 | 0.36 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | PPARA | Q07869 | 3/20 | 0.32 |
| ▸ | PPARG | P37231 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | GABRP | O00591 | 2/20 | 0.31 |
| ▸ | GABRD | O14764 | 2/20 | 0.31 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.31 |
| ▸ | GABRB1 | P18505 | 2/20 | 0.31 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.31 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.31 |
| ▸ | GABRA5 | P31644 | 2/20 | 0.31 |
| ▸ | GABRA3 | P34903 | 2/20 | 0.31 |
| ▸ | GABRA2 | P47869 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2509479 | 0.88 | SLC37A4 (0.35) | KDM4C | |
| SCHEMBL28948581 | 0.85 | SLC37A4 (0.35) | KDM4C | |
| SCHEMBL4905644 | 0.81 | ALDH1A1 (0.39) | TAS1R3TAS1R1KDM4CALDH1A1KDM4E | |
| SCHEMBL1638457 | 0.81 | KMT2A (0.40) | KDM4CALDH1A1KDM4EMEN1RECQL | |
| SCHEMBL14053480 | 0.79 | CHRM1 (0.31) | — | |
| SCHEMBL29159220 | 0.75 | THRB (0.35) | KDM4CALDH1A1KDM4EMEN1RECQL | |
| SCHEMBL9634865 | 0.72 | THRB (0.36) | ALDH1A1KDM4EMEN1RECQLKMT2A | |
| SCHEMBL25385930 | 0.71 | AOC3 (0.39) | MEN1KMT2ACYP1A2TSHR | |
| SCHEMBL6865012 | 0.71 | MAPT (0.34) | TAS1R3TAS1R1ALDH1A1KDM4EPOLB | |
| SCHEMBL6444436 | 0.71 | KDM4E (0.40) | ALDH1A1KDM4EMEN1RECQLKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9134610-B2 | Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-20130189850-A1 | RESIST UNDERLAYER COATING FORMING COMPOSITION FOR FORMING PHOTO-CROSSLINKING CURED RESIST UNDERLAYER COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-8426111-B2 | Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20120288795-A1 | COMPOSITION FOR FORMATION OF PHOTOSENSITIVE RESIST UNDERLAYER FILM AND METHOD FOR FORMATION OF RESIST PATTERN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-8048615-B2 | Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20090162782-A1 | Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| US-20090130594-A1 | Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-21 | — | — | US | disclosed |
| EP-1972998-A1 | SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2008-09-24 | — | — | EP | disclosed |
| EP-1879070-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION FOR FORMING PHOTOCROSSLINKING CURED RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-6890997-B2 | Powder coating of free radical curable epoxy resin and another free radical curable resin | ROHM AND HAAS COMPANY (US) | 2005-05-10 | — | — | US | disclosed |