SCHEMBL25971619

SCHEMBL25971619

CNc1ccc(Oc2ccc(C(c3ccc(Oc4ccc(NC)cc4)cc3)(C(F)(F)F)C(F)(F)F)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KIF11 P52732 1/20 0.48
▸ ESR1 P03372 1/20 0.41
▸ ESR2 Q92731 1/20 0.41
▸ PTPN1 P18031 1/20 0.41
▸ PDK1 Q15118 1/20 0.39
▸ PDK2 Q15119 1/20 0.39
▸ PDK3 Q15120 1/20 0.39
▸ PDK4 Q16654 1/20 0.39
▸ KCNH2 Q12809 4/20 0.36
▸ SCN9A Q15858 2/20 0.36
▸ SCN5A Q14524 1/20 0.36
▸ HPGD P15428 2/20 0.36
▸ MAPT P10636 2/20 0.36
▸ NPC1 O15118 1/20 0.36
▸ ALDH1A1 P00352 1/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ RAB9A P51151 1/20 0.36
▸ TSHR P16473 1/20 0.36
▸ HTT P42858 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10721134 0.88 KIF11 (0.59) KIF11ESR1ESR2PDK1PDK2
SCHEMBL22295592 0.81 HSD11B1 (0.43) KIF11PTPN1MAPTALDH1A1TSHR
SCHEMBL761659 0.79 TSHR (0.48) ESR1ESR2HPGDMAPTNPC1
SCHEMBL15339364 0.79 TSHR (0.48) ESR1ESR2HPGDMAPTNPC1
SCHEMBL9741059 0.79 PTPN1 (0.42) ESR1ESR2PTPN1PDK1PDK2
SCHEMBL25986531 0.79 LTA4H (0.50) ESR1ESR2HPGDMAPTNPC1
SCHEMBL9741002 0.79 TEAD4 (0.48) ESR1ESR2KCNH2HPGDMAPT
SCHEMBL275843 0.79 TEAD4 (0.48) ESR1ESR2KCNH2HPGDMAPT
SCHEMBL23894756 0.78 SMN1; SMN2 (0.59) PDK1PDK2PDK3PDK4HPGD
SCHEMBL19255831 0.77 ALDH1A1 (0.49) PTPN1KCNH2SCN9ASCN5AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 — — US disclosed
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