SCHEMBL25998080

SCHEMBL25998080

Cc1cc(C(c2ccccc2)c2cc(O)c(O)cc2C)c(N)cc1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.35
▸ MAPT P10636 3/20 0.35
▸ KDM4E B2RXH2 3/20 0.35
▸ CYP1A2 P05177 2/20 0.35
▸ CYP3A4 P08684 2/20 0.35
▸ CYP2C19 P33261 2/20 0.35
▸ PKM P14618 2/20 0.35
▸ NPSR1 Q6W5P4 2/20 0.35
▸ HPGD P15428 2/20 0.35
▸ ALOX15 P16050 2/20 0.35
▸ ALOX12 P18054 2/20 0.35
▸ HSD17B10 Q99714 2/20 0.35
▸ CYP2D6 P10635 1/20 0.35
▸ G6PD P11413 1/20 0.35
▸ CYP2C9 P11712 1/20 0.35
▸ MAPK1 P28482 1/20 0.35
▸ CCR6 P51684 1/20 0.35
▸ HIF1A Q16665 1/20 0.35
▸ TYR P14679 1/20 0.33
▸ HKDC1 Q2TB90 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5612635 0.87 ALDH1A1 (0.45) ALDH1A1MAPTKDM4ECYP1A2CYP3A4
SCHEMBL21087439 0.87 LMNA (0.36) ALDH1A1MAPTCYP1A2CYP3A4CYP2C19
SCHEMBL4060913 0.86 TYR (0.42) ALDH1A1MAPTKDM4ECYP1A2CYP3A4
SCHEMBL278561 0.79 CYP2D6 (0.50) ALDH1A1MAPTKDM4ECYP1A2CYP3A4
SCHEMBL12922916 0.78 HSD17B1 (0.41) ALDH1A1MAPTKDM4ECYP1A2CYP3A4
SCHEMBL8579882 0.77 CYP3A4 (0.38) ALDH1A1KDM4ECYP1A2CYP3A4CYP2C19
SCHEMBL8130850 0.77 CYP3A4 (0.43) ALDH1A1CYP3A4CYP2C19PKMCYP2C9
SCHEMBL21096811 0.77 TYR (0.46) ALDH1A1CYP1A2CYP2C19ALOX15CYP2D6
SCHEMBL12922960 0.74 KDM4E (0.45) ALDH1A1MAPTKDM4ECYP1A2CYP3A4
SCHEMBL21775831 0.74 ALDH1A1 (0.45) ALDH1A1MAPTKDM4ECYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3398983-B1 POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS SHINETSU CHEMICAL CO (JP) 2023-09-27 — — EP disclosed
EP-4056627-B1 POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSTION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHINETSU CHEMICAL CO (JP) 2023-08-23 — — EP disclosed
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