Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.38 |
| ▸ | ACP3 | P15309 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | G6PD | P11413 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5612635 | 0.90 | ALDH1A1 (0.45) | TYRLMNAHTTHKDC1ACP3 | |
| SCHEMBL21096811 | 0.90 | TYR (0.46) | TYRLMNAHTTACP3ALDH1A1 | |
| SCHEMBL25998080 | 0.86 | ALDH1A1 (0.35) | TYRLMNAHTTHKDC1ALDH1A1 | |
| SCHEMBL9615467 | 0.85 | LMNA (0.49) | TYRLMNAHTTALDH1A1MAPT | |
| SCHEMBL4055460 | 0.84 | ESR1 (0.41) | LMNAALDH1A1MAPTHSD17B10NPSR1 | |
| SCHEMBL5372483 | 0.83 | ALOX15 (0.56) | TYRLMNAHTTHKDC1ALDH1A1 | |
| SCHEMBL21087439 | 0.82 | LMNA (0.36) | TYRLMNAHKDC1ALDH1A1MAPT | |
| SCHEMBL28539201 | 0.82 | BACE1 (0.50) | TYRLMNAHTTHKDC1ALDH1A1 | |
| SCHEMBL12922916 | 0.80 | HSD17B1 (0.41) | LMNAHTTACP3ALDH1A1MAPT | |
| SCHEMBL278561 | 0.79 | CYP2D6 (0.50) | LMNAHTTALDH1A1MAPTHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7089888-A | — | — | None | — | — | JP | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| EP-3498788-B1 | SOLDER MASK INKJET INKS FOR MANUFACTURING PRINTED CIRCUIT BOARDS | AGFA GEVAERT NV (BE) | 2023-05-03 | — | — | EP | disclosed |
| US-20220411654-A1 | Radiation Curable Inkjet Ink for Manufacturing Printed Circuit Boards | AGFA-GEVAERT NV (BE) | 2022-12-29 | — | — | US | disclosed |
| US-11333975-B2 | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2022-05-17 | — | — | US | disclosed |
| US-20220091509-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-03-24 | — | — | US | disclosed |
| US-20220025199-A1 | RADIATION CURABLE INKJET INK FOR MANUFACTURING PRINTED CIRCUIT BOARDS | AGFA-GEVAERT NV (BE) | 2022-01-27 | — | — | US | disclosed |
| US-20220010156-A1 | RADIATION CURABLE INKJET INK FOR MANUFACTURING PRINTED CIRCUIT BOARDS | AGFA-GEVAERT NV (BE) | 2022-01-13 | — | — | US | disclosed |
| US-20210403738-A1 | NOVEL PHOTOINITIATORS | AGFA-GEVAERT NV (BE) | 2021-12-30 | — | — | US | disclosed |
| US-20120184100-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120184101-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120184101-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| JP-2007169493-A | EPOXY RESIN COMPOSITION FOR SEALING AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC WORKS LTD | 2007-07-05 | — | — | JP | disclosed |
| US-20040225048-A1 | Vibration damping material composition | TITECS JAPAN CORPORATION (JP) | 2004-11-11 | — | — | US | disclosed |
| EP-1408075-A1 | Vibration damping material composition | Titecs Japan Corporation (JP) | 2004-04-14 | — | — | EP | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| JP-H0789888-A | PRODUCTION OF BISCATECHOL | ASAHI ORGANIC CHEM IND CO LTD | 1995-04-04 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | TYR 1522/4885LMNA 202/4885HTT 1421/4885 |
| US-20210403738-A1 | NOVEL PHOTOINITIATORS | AGK, AASDHPPT, BCKDK | TYR 1377/4885LMNA 3774/4885HTT 1965/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.