SCHEMBL26053155

SCHEMBL26053155

C=C1OC/C(c2ccccc2)=C\c2ccccc2O1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NISCH Q9Y2I1 1/20 0.40
DRD2 P14416 4/20 0.34
DRD4 P21917 4/20 0.34
LMNA P02545 2/20 0.33
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
RARA P10276 2/20 0.32
RARG P13631 2/20 0.32
ALOX5 P09917 1/20 0.32
RARB P10826 1/20 0.32
GPR84 Q9NQS5 1/20 0.31
CA12 O43570 1/20 0.31
CA9 Q16790 1/20 0.31
CYP19A1 P11511 1/20 0.30
CYP11B1 P15538 1/20 0.30
CYP11B2 P19099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29518399 0.84 NISCH (0.53) NISCHLMNANPC1RAB9AKDM4E
SCHEMBL230113 0.84 NISCH (0.53) NISCHLMNANPC1RAB9AKDM4E
SCHEMBL28660162 0.71 PTGS1 (0.48) NISCHNPC1RAB9AKDM4EALDH1A1
SCHEMBL26549421 0.71 NISCH (0.48) NISCHNPC1RAB9AKDM4EALDH1A1
SCHEMBL28660144 0.71 MAPT (0.50) NISCHLMNANPC1RAB9AKDM4E
SCHEMBL616344 0.70 RARA (0.46) NISCHRAB9AALDH1A1MAPTRARA
SCHEMBL17933761 0.66 MAOA (0.50) NISCHLMNANPC1RAB9AKDM4E
SCHEMBL11230728 0.66 LMNA (0.44) NISCHLMNANPC1RAB9AKDM4E
SCHEMBL28672526 0.66 ALOX5 (0.46) NISCHLMNAALDH1A1MAPTRARA
SCHEMBL571115 0.66 MAPT (0.45) NISCHDRD2DRD4LMNANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162838-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-08-31 WO disclosed