SCHEMBL2625679

SCHEMBL2625679

CCC(C)(C)C(=O)OCCC(=O)OC1CC(C)OC1=O

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 2/20 0.34
KDM4E B2RXH2 2/20 0.32
MMP3 P08254 1/20 0.32
CYP3A4 P08684 3/20 0.31
HMGCR P04035 3/20 0.31
ALDH1A1 P00352 3/20 0.31
USP2 O75604 2/20 0.31
TSHR P16473 2/20 0.31
MEN1 O00255 2/20 0.31
MAPT P10636 2/20 0.31
KMT2A Q03164 2/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
NR1I2 O75469 1/20 0.31
ABCB11 O95342 1/20 0.31
NR3C1 P04150 1/20 0.31
PGR P06401 1/20 0.31
ABCB1 P08183 1/20 0.31
ADORA3 P0DMS8 1/20 0.31
CYP2C8 P10632 1/20 0.31
CHRM1 P11229 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2607854 0.88 ATM (0.33) ATMKDM4ECYP3A4HMGCRALDH1A1
SCHEMBL111770 0.84 HMGCR (0.36) ATMKDM4ECYP3A4HMGCRALDH1A1
SCHEMBL47562 0.79 KDM4E (0.44) ATMKDM4EALDH1A1TSHRSMN1; SMN2
SCHEMBL1697109 0.78 TSHR (0.36) ATMMMP3CYP3A4ALDH1A1TSHR
SCHEMBL1697100 0.78 ALDH1A1 (0.36) ATMKDM4EMMP3CYP3A4ALDH1A1
SCHEMBL2625680 0.76 FKBP1A (0.30)
SCHEMBL2625681 0.75 HMGCR (0.33) KDM4ECYP3A4HMGCRALDH1A1USP2
SCHEMBL15294390 0.74
SCHEMBL6354066 0.74 PRKCA (0.32)
SCHEMBL19413945 0.74 ATM (0.31) ATMALDH1A1MEN1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9291893-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-22 US disclosed
US-20120178021-A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-07-12 US disclosed
US-20120115082-A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-10 US disclosed
US-20120100483-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-04-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120178021-A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME SULT1A1, SULT1E1, C1S ATM 2163/4885KDM4E 591/4885MMP3 2298/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.