Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 11/20 | 0.40 |
| ▸ | CA2 | P00918 | 11/20 | 0.40 |
| ▸ | MMP1 | P03956 | 6/20 | 0.40 |
| ▸ | MMP2 | P08253 | 6/20 | 0.40 |
| ▸ | MMP9 | P14780 | 6/20 | 0.40 |
| ▸ | MMP8 | P22894 | 6/20 | 0.40 |
| ▸ | MMP13 | P45452 | 6/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | APEX1 | P27695 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10212543 | 0.96 | CA1 (0.46) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL2632781 | 0.88 | CA1 (0.43) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL19042267 | 0.85 | CA1 (0.44) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL217339 | 0.85 | THRB (0.42) | CA1CA2THRBTSHRALDH1A1 | |
| SCHEMBL19042275 | 0.81 | CA2 (0.50) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL16866880 | 0.80 | THRB (0.38) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL10151017 | 0.78 | CA1 (0.41) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL29662164 | 0.78 | CA1 (0.44) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL3841895 | 0.78 | THRB (0.34) | THRBTSHR | |
| Sulfluramid SCHEMBL29720503 | 0.77 | CA1 (0.43) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120156620-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120100483-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120100482-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-12 | — | — | US | disclosed |
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120052443-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120052440-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120028188-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| EP-1246856-A1 | FLUOROCHEMICAL SULFONAMIDE SURFACTANTS | 3M Innovative Properties Company (US) | 2002-10-09 | — | — | EP | disclosed |
| WO-2001030873-A1 | FLUOROCHEMICAL SULFONAMIDE SURFACTANTS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2001-05-03 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120052440-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | C1S, C1R, CLIC1 | CA1 1106/4885CA2 86/4885MMP1 3919/4885 |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SULT1A1, SULT1E1, C1S | CA1 671/4885CA2 2117/4885MMP1 3386/4885 |
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | AFF1, FGFR1, FRG1 | CA1 886/4885CA2 166/4885MMP1 3910/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.