Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | HTT | P42858 | 2/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | DHFR | P00374 | 1/20 | 0.39 |
| ▸ | AKT1 | P31749 | 6/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | CNR2 | P34972 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.36 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.36 |
| ▸ | HTR2A | P28223 | 1/20 | 0.36 |
| ▸ | THRA | P10827 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2634897 | 0.92 | CA2 (0.40) | KCNH2LMNAHTTCYP2D6CYP2C9 | |
| SCHEMBL5851758 | 0.85 | LIPG (0.35) | CA2CA12CA1CA9 | |
| SCHEMBL2965334 | 0.83 | CA2 (0.54) | KCNH2LMNAHTTCYP2D6CYP2C9 | |
| SCHEMBL2955495 | 0.83 | CA2 (0.54) | KCNH2LMNAHTTCYP2D6CYP2C9 | |
| SCHEMBL5849458 | 0.82 | MAPT (0.37) | CYP2C9CYP2C19CA2SMN1; SMN2 | |
| SCHEMBL5849481 | 0.80 | TDP1 (0.39) | LMNAHTTCYP2D6CYP2C9CYP2C19 | |
| SCHEMBL2960150 | 0.78 | CA2 (0.54) | KCNH2LMNAHTTCYP2D6CYP2C9 | |
| SCHEMBL2966132 | 0.78 | KCNH2 (0.58) | KCNH2LMNAHTTCYP2D6CYP2C9 | |
| SCHEMBL2967119 | 0.78 | KCNH2 (0.58) | KCNH2LMNAHTTCYP2D6CYP2C9 | |
| SCHEMBL2960491 | 0.75 | ALOX15B (0.46) | KCNH2LMNAHTTCYP2D6CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024107979-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2024-05-23 | — | — | WO | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| EP-1609024-B1 | PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-09-30 | — | — | EP | disclosed |
| EP-1636648-B1 | NOVEL POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-08-12 | — | — | EP | disclosed |
| US-9034557-B2 | Chemically amplified positive photoresist composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-05-19 | — | — | US | disclosed |
| EP-1636649-B1 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2014-08-13 | — | — | EP | disclosed |
| EP-2438486-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION | FujiFilm Electronic Materials USA, Inc. (US) | 2012-04-11 | — | — | EP | disclosed |
| WO-2010141444-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-12-09 | — | — | WO | disclosed |
| US-20100304299-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2010-12-02 | — | — | US | disclosed |
| US-7803510-B2 | Positive photosensitive polybenzoxazole precursor compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-09-28 | — | — | US | disclosed |
| WO-2004027518-A2 | A METHOD FOR THE REMOVAL OF AN IMAGING LAYER FROM A SEMICONDUCTOR SUBSTRATE STACK | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-04-01 | — | — | WO | disclosed |
| US-20040034160-A1 | Acetal protected polymers and photoresists compositions thereof | ARCH SPECIALITY CHEMICALS, INC. | 2004-02-19 | — | — | US | disclosed |
| WO-2003099782-A2 | ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-12-04 | — | — | WO | disclosed |
| EP-1299773-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | disclosed |
| EP-1299774-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | disclosed |
| US-20030064321-A1 | Free-acid containing polymers and their use in photoresists | ARCH SPECIALTY CHEMICALS, INC. | 2003-04-03 | — | — | US | disclosed |
| WO-2003021357-A1 | FREE-ACID CONTAINING POLYMERS AND THEIR USE IN PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-03-13 | — | — | WO | disclosed |
| US-20020197558-A1 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-26 | — | — | US | disclosed |
| WO-2002082184-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |
| WO-2002082185-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |