SCHEMBL26413552

SCHEMBL26413552

CNc1ccccc1C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.50
POLB P06746 1/20 0.50
ATM Q13315 1/20 0.50
KCNA3 P22001 1/20 0.46
OPRM1 P35372 3/20 0.41
ALOX15 P16050 2/20 0.38
MAPT P10636 1/20 0.38
ADRA1A P35348 5/20 0.37
ADRA1B P35368 5/20 0.37
ADRA1D P25100 4/20 0.37
ALDH1A1 P00352 2/20 0.35
GAA P10253 1/20 0.35
KMT2A Q03164 1/20 0.35
P2RX7 Q99572 1/20 0.34
ABCC1 P33527 1/20 0.34
HDAC1 Q13547 1/20 0.34
HSD17B10 Q99714 1/20 0.34
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944852 0.83 OPRM1 (0.47) OPRM1KMT2AP2RX7
SCHEMBL24944073 0.83 OPRM1 (0.44) OPRM1ALDH1A1HDAC1
SCHEMBL24944349 0.82 AKR1C3 (0.42) ATMOPRM1MAPTALDH1A1GAA
SCHEMBL24944623 0.81 RXFP1 (0.46) POLBOPRM1ALDH1A1GAAKMT2A
SCHEMBL24944311 0.81 HPGD (0.44) KDM4EOPRM1ALOX15MAPTALDH1A1
SCHEMBL26413478 0.81 SIGMAR1 (0.46) KCNA3OPRM1MAPTALDH1A1KMT2A
SCHEMBL24944269 0.81 OPRM1 (0.42) OPRM1KMT2A
SCHEMBL26413623 0.80 OPRM1 (0.41) KDM4EOPRM1MAPTALDH1A1HSD17B10
SCHEMBL26413472 0.80 ALDH1A1 (0.44) KDM4EPOLBOPRM1MAPTALDH1A1
SCHEMBL26478633 0.80 OPRM1 (0.44) KDM4EPOLBOPRM1MAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR KDM4E 1069/4885POLB 154/4885ATM 4456/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.