SCHEMBL26413634

SCHEMBL26413634

Cc1cccc(C(=O)OC2(c3ccccc3)CCNCC2)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRD O14764 1/20 0.49
GABRA1 P14867 1/20 0.49
GABRB1 P18505 1/20 0.49
GABRA5 P31644 1/20 0.49
GABRA3 P34903 1/20 0.49
GABRA2 P47869 1/20 0.49
GABRB2 P47870 1/20 0.49
GABRA4 P48169 1/20 0.49
OPRM1 P35372 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.41
ALDH1A1 P00352 2/20 0.41
NPSR1 Q6W5P4 1/20 0.41
MAPT P10636 3/20 0.40
NPC1 O15118 2/20 0.40
POLB P06746 3/20 0.40
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
PARP1 P09874 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
TACR1 P25103 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944091 0.90 OPRM1 (0.46) GABRDGABRA1GABRB1GABRA5GABRA3
SCHEMBL24944068 0.87 OPRM1 (0.41) GABRDGABRA1GABRB1GABRA5GABRA3
SCHEMBL24943664 0.86 OPRM1 (0.46) OPRM1ALDH1A1TACR1
SCHEMBL24944312 0.86 RAB9A (0.42) OPRM1NPC1PARP1TACR1RAB9A
SCHEMBL24943715 0.86 KMO (0.43) OPRM1ALDH1A1MAPT
SCHEMBL24944860 0.85 OPRM1 (0.47) GABRDGABRA1GABRB1GABRA5GABRA3
SCHEMBL26413476 0.85 ALDH1A1 (0.48) OPRM1SMN1; SMN2ALDH1A1NPSR1NPC1
SCHEMBL24944622 0.85 KCNA3 (0.42) OPRM1SMN1; SMN2ALDH1A1NPSR1MAPT
SCHEMBL26478634 0.85 GAA (0.45) OPRM1SMN1; SMN2ALDH1A1NPSR1NPC1
SCHEMBL24944248 0.84 OPRM1 (0.39) GABRDGABRA1GABRB1GABRA5GABRA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR GABRD 835/4885GABRA1 1177/4885GABRB1 1056/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.