SCHEMBL26426973

SCHEMBL26426973

O=C(OC1CCC(C(=O)OC2(c3ccccc3)CCNCC2)CC1)c1cc(I)cc(I)c1O

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ OPRM1 P35372 1/20 0.32
▸ PTPRF P10586 1/20 0.31
▸ PTPN2 P17706 1/20 0.31
▸ PTPN1 P18031 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426945 0.92 OPRM1 (0.32) OPRM1PTPRFPTPN2PTPN1
SCHEMBL26426913 0.84 OPRM1 (0.36) OPRM1
SCHEMBL26426983 0.81 — —
SCHEMBL26426914 0.80 OPRM1 (0.34) OPRM1
SCHEMBL24944575 0.78 OPRM1 (0.43) OPRM1
SCHEMBL26426918 0.78 HTR2A (0.35) OPRM1
SCHEMBL26426916 0.78 OPRM1 (0.33) OPRM1
SCHEMBL26426964 0.78 OPRM1 (0.37) OPRM1
SCHEMBL26426932 0.77 TTR (0.31) —
SCHEMBL26426978 0.76 KMT2A (0.34) OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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