SCHEMBL26426978

SCHEMBL26426978

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(OC(=O)c2cc(I)cc(I)c2O)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 5/20 0.34
▸ ALDH1A1 P00352 3/20 0.34
▸ PARP10 Q53GL7 1/20 0.33
▸ NSD2 O96028 1/20 0.33
▸ HPGD P15428 2/20 0.32
▸ ALOX15 P16050 1/20 0.32
▸ HSD17B10 Q99714 1/20 0.32
▸ OPRM1 P35372 1/20 0.31
▸ MAPT P10636 3/20 0.31
▸ MEN1 O00255 2/20 0.31
▸ LMNA P02545 1/20 0.31
▸ TP53 P04637 1/20 0.31
▸ CYP3A4 P08684 1/20 0.31
▸ ADORA3 P0DMS8 1/20 0.31
▸ CHRM1 P11229 1/20 0.31
▸ TBXA2R P21731 1/20 0.31
▸ SLC6A2 P23975 1/20 0.31
▸ PDE4A P27815 1/20 0.31
▸ ADRA1A P35348 1/20 0.31
▸ KDR P35968 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426947 0.91 KMT2A (0.33) KMT2AALDH1A1PARP10HPGDOPRM1
SCHEMBL26426913 0.89 OPRM1 (0.36) OPRM1HDAC1TACR1
SCHEMBL26426914 0.85 OPRM1 (0.34) OPRM1TACR1
SCHEMBL26426916 0.82 OPRM1 (0.33) OPRM1TACR1
SCHEMBL26426918 0.82 HTR2A (0.35) OPRM1TACR1
SCHEMBL26426932 0.81 TTR (0.31) KMT2AMEN1HTT
SCHEMBL26426965 0.80 OPRM1 (0.35) OPRM1TACR1
SCHEMBL26426964 0.80 OPRM1 (0.37) OPRM1TACR1
SCHEMBL26426881 0.79 OPRM1 (0.37) OPRM1HDAC1TACR1
SCHEMBL26426925 0.78 DPP4 (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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