SCHEMBL26452007

SCHEMBL26452007

CC(F)C(=O)NC(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.49
ALDH1A1 P00352 6/20 0.49
LMNA P02545 2/20 0.49
NPSR1 Q6W5P4 1/20 0.49
HTT P42858 3/20 0.46
CA2 P00918 1/20 0.46
GLA P06280 1/20 0.46
GAA P10253 1/20 0.44
CNR2 P34972 1/20 0.44
KDM4E B2RXH2 1/20 0.43
PKM P14618 1/20 0.43
CYP17A1 P05093 2/20 0.43
EPHX1 P07099 1/20 0.43
CRHBP P24387 1/20 0.42
CRHR2 Q13324 1/20 0.42
MCOLN3 Q8TDD5 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25972729 0.85 ALDH1A1 (0.51) POLBALDH1A1LMNANPSR1HTT
SCHEMBL24028229 0.78 POLB (0.42) POLBALDH1A1LMNANPSR1HTT
SCHEMBL7705993 0.73 ALDH1A1 (0.67) ALDH1A1LMNAHTTCA2GLA
SCHEMBL27444946 0.71 ALDH1A1 (0.58) POLBALDH1A1LMNANPSR1HTT
SCHEMBL25765152 0.70 ALDH1A1 (0.57) POLBALDH1A1LMNANPSR1HTT
SCHEMBL16000784 0.70 ALDH1A1 (0.51) POLBALDH1A1LMNANPSR1HTT
SCHEMBL2841738 0.70 THRB (0.63) ALDH1A1LMNANPSR1HTTGLA
SCHEMBL23220249 0.70 THRB (0.63) ALDH1A1LMNANPSR1HTTGLA
SCHEMBL1758676 0.69 SMN1; SMN2 (0.58) ALDH1A1HTTCA2GLAKDM4E
SCHEMBL13840110 0.69 SMN1; SMN2 (0.57) POLBALDH1A1HTTCA2GLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20230133710-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-05-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device RER1, COL1A1, RAD51 POLB 484/4885ALDH1A1 762/4885LMNA 143/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.