SCHEMBL24028229

SCHEMBL24028229

O=C(NC(=O)C12CC3CC(CC(C3)C1)C2)C(F)S(=O)(=O)O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.42
ALDH1A1 P00352 6/20 0.42
LMNA P02545 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
HTT P42858 3/20 0.41
KDM4E B2RXH2 1/20 0.41
ITGB1 P05556 1/20 0.41
ITGA4 P13612 1/20 0.41
GAA P10253 1/20 0.41
CNR2 P34972 1/20 0.41
CRHBP P24387 1/20 0.39
CRHR2 Q13324 1/20 0.39
MCOLN3 Q8TDD5 1/20 0.39
GLA P06280 1/20 0.39
STS P08842 1/20 0.39
P2RX7 Q99572 2/20 0.39
P2RX4 Q99571 1/20 0.39
CA12 O43570 1/20 0.38
CA9 Q16790 1/20 0.38
HPGD P15428 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26452007 0.78 POLB (0.49) POLBALDH1A1LMNANPSR1HTT
SCHEMBL14802972 0.78 ALDH1A1 (0.41) ALDH1A1HTTKDM4EITGB1ITGA4
SCHEMBL25972729 0.74 ALDH1A1 (0.51) POLBALDH1A1LMNANPSR1HTT
SCHEMBL15858506 0.73 ALDH1A1 (0.53) ALDH1A1P2RX7
SCHEMBL14803006 0.73 GAA (0.32) ALDH1A1HTTKDM4EITGB1ITGA4
SCHEMBL24028378 0.71 ALDH1A1 (0.45) POLBALDH1A1LMNANPSR1HTT
SCHEMBL17703586 0.69 HTT (0.54) POLBALDH1A1LMNAHTTKDM4E
SCHEMBL15858330 0.68 SMN1; SMN2 (0.45) ALDH1A1NPSR1P2RX7CA12CA9
SCHEMBL15326221 0.68 PRKCA (0.44) ALDH1A1LMNANPSR1GAA
SCHEMBL16000784 0.67 ALDH1A1 (0.51) POLBALDH1A1LMNANPSR1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20210356862-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-11-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210356862-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE RER1, COL1A1, RAD51 POLB 484/4885ALDH1A1 762/4885LMNA 143/4885
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device RER1, COL1A1, RAD51 POLB 484/4885ALDH1A1 762/4885LMNA 143/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.