SCHEMBL26532196

SCHEMBL26532196

CCO[Si](OCC)(OCC)c1cccc(C(C)(O)C(F)(F)F)c1

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.38
CYP4A11 Q02928 1/20 0.38
RXRA P19793 1/20 0.35
GRIN1 Q05586 1/20 0.35
GRIN2B Q13224 1/20 0.35
HSD11B1 P28845 7/20 0.35
NR1H2 P55055 5/20 0.35
NR1H3 Q13133 5/20 0.35
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33
HCRTR1 O43613 1/20 0.32
HCRTR2 O43614 1/20 0.32
MAPK1 P28482 1/20 0.32
TAS1R3 Q7RTX0 1/20 0.32
TAS1R1 Q7RTX1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23040287 0.87 NR1H3 (0.46) NR1H2NR1H3
SCHEMBL7732408 0.83 L3MBTL1 (0.43) ALDH1A1TSHRMAPK1TAS1R3TAS1R1
SCHEMBL26532200 0.78 TAS1R3 (0.32) ALDH1A1TAS1R3TAS1R1
SCHEMBL26532199 0.77
SCHEMBL15736663 0.76 L3MBTL1 (0.40) ALDH1A1TSHRMAPK1
SCHEMBL15733442 0.76 L3MBTL1 (0.40) ALDH1A1TSHRMAPK1
SCHEMBL574271 0.75 TP53 (0.33) ALDH1A1MAPK1
SCHEMBL28532235 0.74 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL28073117 0.73 NR1H2 (0.47) NR1H2NR1H3
SCHEMBL23040282 0.71 NR1H2 (0.62) NR1H2NR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230333468-A1 RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR PRODUCING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN CURED FILM, METHOD FOR PRODUCING POLYMER, AND METHOD FOR PRODUCING RESIN COMPOSITION CENTRAL GLASS COMPANY, LIMITED (JP) 2023-10-19 US disclosed
US-20230322818-A1 SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD OF MANUFACTURING CURED FILM, PATTERNED CURED FILM, AND METHOD OF MANUFACTURING PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2023-10-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230322818-A1 SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD OF MANUFACTURING CURED FILM, PATTERNED CURED FILM, AND METHOD OF MANUFACTURING PATTERNED CURED FILM RAD51, RER1, RPS4Y1 CYP4F2 2811/4885CYP4A11 1594/4885RXRA 138/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.