Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G2D | Q9UNK4 | 1/20 | 0.32 |
| ▸ | NQO2 | P16083 | 1/20 | 0.32 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.32 |
| ▸ | TYMS | P04818 | 1/20 | 0.32 |
| ▸ | TRPV1 | Q8NER1 | 4/20 | 0.32 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | PTGES | O14684 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18470387 | 0.83 | FTO (0.34) | THRBKMT2AHSD17B10 | |
| SCHEMBL18470397 | 0.81 | THRB (0.39) | THRB | |
| SCHEMBL18470395 | 0.81 | THRA (0.32) | THRATHRBKMT2AHSD17B10 | |
| SCHEMBL18470399 | 0.80 | THRA (0.37) | TYMSTHRATHRBKMT2AHSD17B10 | |
| SCHEMBL25560943 | 0.78 | TYMS (0.35) | TYMSTHRATHRB | |
| SCHEMBL13079573 | 0.78 | CES2 (0.41) | KMT2A | |
| SCHEMBL18470393 | 0.78 | SLC2A1 (0.33) | KMT2A | |
| SCHEMBL25561077 | 0.76 | SIRT5 (0.39) | NQO2TRPV1 | |
| SCHEMBL18470400 | 0.76 | TDP1 (0.31) | KMT2AHSD17B10 | |
| SCHEMBL18470383 | 0.75 | P4HB (0.33) | KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230341775-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-26 | — | — | US | disclosed |
| US-20230341775-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-26 | — | — | US | disclosed |