Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.39 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.38 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.38 |
| ▸ | CXCR2 | P25025 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | TUBB1 | Q9H4B7 | 1/20 | 0.37 |
| ▸ | ROCK2 | O75116 | 1/20 | 0.36 |
| ▸ | ACACB | O00763 | 1/20 | 0.36 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.36 |
| ▸ | APP | P05067 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26794111 | 0.83 | SHBG (0.41) | LMNAKMT2AAPPCYP2C19PTGS2 | |
| SCHEMBL18240787 | 0.83 | LMNA (0.44) | LMNAMAPK1HTTRAB9AFFAR1 | |
| SCHEMBL26862711 | 0.83 | LMNA (0.41) | LMNAMAPK1HTTRAB9AFFAR1 | |
| SCHEMBL26861530 | 0.82 | TSHR (0.52) | HTTRAB9AKMT2ACYP19A1 | |
| SCHEMBL17844798 | 0.81 | LMNA (0.47) | LMNAMAPK1HTTRAB9AFFAR1 | |
| SCHEMBL38657965 | 0.81 | HIF1A (0.36) | LMNAKMT2ACYP2C19 | |
| SCHEMBL26816149 | 0.81 | HIF1A (0.36) | LMNAKMT2ACYP2C19 | |
| SCHEMBL26059981 | 0.80 | ADRB1 (0.40) | APPCYP2C19 | |
| SCHEMBL14258939 | 0.78 | TSHR (0.41) | HTTKMT2ACYP19A1 | |
| SCHEMBL26862030 | 0.78 | PTPN11 (0.35) | LMNAAPPCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230375925-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | FUJIFILM CORPORATION (JP) | 2023-11-23 | — | — | US | disclosed |