Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RARB | P10826 | 10/20 | 0.45 |
| ▸ | RARG | P13631 | 10/20 | 0.45 |
| ▸ | RARA | P10276 | 9/20 | 0.45 |
| ▸ | MEN1 | O00255 | 4/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.45 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | PGR | P06401 | 1/20 | 0.45 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.45 |
| ▸ | GOT1 | P17174 | 1/20 | 0.45 |
| ▸ | GLRA1 | P23415 | 1/20 | 0.45 |
| ▸ | BLM | P54132 | 1/20 | 0.45 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2709593 | 0.86 | RARB (0.55) | RARBRARGRARAMEN1KMT2A | |
| Hydrochloric Acid SCHEMBL3188443 | 0.85 | RARB (0.54) | RARBRARGRARAMEN1KMT2A | |
| SCHEMBL2708650 | 0.85 | RARB (0.54) | RARBRARGRARAMEN1KMT2A | |
| Hydrochloric Acid SCHEMBL2706997 | 0.85 | RARB (0.54) | RARBRARGRARAMEN1KMT2A | |
| SCHEMBL2709455 | 0.78 | EPHX2 (0.44) | RARBRARGRARAMEN1KMT2A | |
| SCHEMBL2707687 | 0.77 | ALDH1A1 (0.50) | RARBRARGRARAMEN1KMT2A | |
| SCHEMBL3190249 | 0.77 | NPC1 (0.45) | MEN1KMT2APGRALDH1A1MAPT | |
| SCHEMBL2709132 | 0.76 | RARB (0.45) | RARBRARGRARAMEN1KMT2A | |
| Adapalene SCHEMBL642211 | 0.72 | RARB (0.80) | RARBRARGRARAMEN1KMT2A | |
| SCHEMBL2707709 | 0.72 | MEN1 (0.38) | RARBRARGRARAMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2000510-B1 | RESIN COMPOSITION, VARNISH, RESIN FILM, AND SEMICONDUCTOR DEVICE USING THE RESIN FILM | SUMITOMO BAKELITE CO (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-7863347-B2 | Resin composition, varnish, resin film and semiconductor device using the same | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2011-01-04 | — | — | US | disclosed |
| US-7652125-B2 | Resin composition, polyimide resin composition, polybenzoxazole resin composition, varnish, resin film and semiconductor device using the same | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2010-01-26 | — | — | US | disclosed |
| US-20090118431-A1 | RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE USING THE SAME | SUMITOMO BAKELITE COMPANY, LTD (JP) | 2009-05-07 | — | — | US | disclosed |
| EP-2000510-A1 | RESIN COMPOSITION, VARNISH, RESIN FILM, AND SEMICONDUCTOR DEVICE USING THE RESIN FILM | Sumitomo Bakelite Company, Ltd. (JP) | 2008-12-10 | — | — | EP | disclosed |
| US-20080255335-A1 | Resin Composition, Polyimide Resin Composition, Polybenzoxazole Resin Composition, Varnish, Resin Film and Semiconductor Device Using the Same | SUMITOMO BAKELITE COMPANY LTD. (JP) | 2008-10-16 | — | — | US | disclosed |
| EP-1813637-A1 | RESIN COMPOSITION, POLYIMIDE RESIN COMPOSITION, POLY- BENZOXAZOLE RESIN COMPOSITION, VARNISHES, RESIN FILMS AND SEMICONDUCTOR DEVICES MADE BY USING THE SAME | Sumitomo Bakelite Company, Limited (JP) | 2007-08-01 | — | — | EP | disclosed |