SCHEMBL27284232

SCHEMBL27284232

CCCOC(O)(CO)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.40
HTT P42858 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
CHRM3 P20309 4/20 0.38
CHRM2 P08172 2/20 0.38
CHRM1 P11229 2/20 0.38
MLNR O43193 1/20 0.38
HTR2A P28223 1/20 0.38
HTR2C P28335 1/20 0.38
HRH1 P35367 1/20 0.38
OPRM1 P35372 1/20 0.38
DRD3 P35462 1/20 0.38
OPRK1 P41145 1/20 0.38
HTR2B P41595 1/20 0.38
SLC6A3 Q01959 1/20 0.38
KCNH2 Q12809 1/20 0.38
CACNA1C Q13936 1/20 0.38
KIF11 P52732 1/20 0.37
ALDH1A1 P00352 2/20 0.36
MEN1 O00255 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26612287 0.80 LMNA (0.38) LMNAHTTL3MBTL1CHRM3CHRM2
SCHEMBL8990313 0.78 LMNA (0.40) LMNACHRM3CHRM2CHRM1MLNR
SCHEMBL1356738 0.76 ALDH1A1 (0.43) LMNAHTTL3MBTL1CHRM3CHRM2
SCHEMBL30670482 0.76 LMNA (0.46) LMNAHTTL3MBTL1CHRM3CHRM2
SCHEMBL11598822 0.74 LTA4H (0.40) LMNAHTTL3MBTL1CHRM3CHRM2
SCHEMBL7556087 0.73 KMT2A (0.47) LMNAHTTL3MBTL1CHRM3CHRM2
SCHEMBL6421037 0.73 KIF11 (0.43) LMNACHRM3CHRM2CHRM1MLNR
SCHEMBL8434800 0.73 KIF11 (0.43) LMNACHRM3CHRM2CHRM1MLNR
SCHEMBL2348691 0.73 KIF11 (0.65) LMNACHRM3CHRM2CHRM1MLNR
SCHEMBL1255415 0.72 LMNA (0.50) LMNACHRM3CHRM2CHRM1MLNR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1603300-B Cyclohexanetricarboxylic monoester and its use MITSUBISHI GAS CHEMICAL CO 2011-05-18 CN disclosed
CN-1498919-B Polyester synthetic resin additive and plasticizer for biological degradability resin KAO CORP 2010-05-12 CN disclosed
CN-100564432-C The manufacture method of foams OJI PAPER CO (JP) 2009-12-02 CN disclosed
CN-100545198-C Sheet-like foam and process for producing the same OJI PAPER CO (JP) 2009-09-30 CN disclosed
CN-100475920-C Ink for spacer controller formation NATOCO CO LTD (JP) 2009-04-08 CN disclosed
CN-101243143-A Electrodepositable aqueous resinous dispersions and methods of making the same PPG IND OHIO INC (US) 2008-08-13 CN disclosed
CN-101031610-A Process for producing foam OJI PAPER CO (JP) 2007-09-05 CN disclosed
CN-1823120-A Foamed product in a sheet form and method for production thereof OJI PAPER CO (JP) 2006-08-23 CN disclosed
CN-1816599-A Ink for spacer formation NATOCO CO LTD (JP) 2006-08-09 CN disclosed
CN-1209397-C Resin dispersion having uniform particle size, resin particle, and method for producing same SANYO CHEMICAL IND LTD (JP) 2005-07-06 CN disclosed
CN-1603300-A Cyclohexanetricarboxylic monoester and its use MITSUBISHI GAS CHEMICAL CO (JP) 2005-04-06 CN disclosed
CN-1551907-A Photodegradation-resistant electrodepositable coating compositions and methods related thereto PPG工业俄亥俄公司 2004-12-01 CN disclosed
CN-1498919-A Polyester synthetic resin additive and plasticizer for biological degradability resin 花王株式会社 2004-05-26 CN disclosed
CN-1400984-A Resin dispersions having uniform particle diameters, resin particles and processes for producing both SANYO CHEMICAL IND LTD (JP) 2003-03-05 CN disclosed
CN-1066465-C Modified epoxy resins having a blocked isocyanate moiety and a cationic group and their use in cathodic electrodeposition paints NIPPON PAINT CO LTD (JP) 2001-05-30 CN disclosed
CN-1111651-A Modified epoxy resins having a blocked isocyanate moiety and a cationic group and their use in cathodic electrodeposition paints JAPAN PAINT CO LTD (JP) 1995-11-15 CN disclosed
CN-1016437-B IMPROVED CATIONIC ELECTRODEPOSITABLE COMPOSITIONS THROUGH USE OF SULFAMIC ACID AND DERIVATIVES THEREOF PPG INDUSTRIES INC (US) 1992-04-29 CN disclosed
CN-1041376-A Improve the composition of cationic electrodepositable with thionamic acid and derivative thereof PPG INDUSTRIES INC (US) 1990-04-18 CN disclosed