Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 9/20 | 0.58 |
| ▸ | IGF1R | P08069 | 6/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | GAA | P10253 | 4/20 | 0.50 |
| ▸ | GFER | P55789 | 2/20 | 0.50 |
| ▸ | SLC28A3 | Q9HAS3 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.48 |
| ▸ | MAPT | P10636 | 4/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.48 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.48 |
| ▸ | DRD2 | P14416 | 2/20 | 0.48 |
| ▸ | DRD1 | P21728 | 2/20 | 0.48 |
| ▸ | DRD4 | P21917 | 2/20 | 0.48 |
| ▸ | DRD5 | P21918 | 2/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.48 |
| ▸ | DRD3 | P35462 | 2/20 | 0.48 |
| ▸ | RECQL | P46063 | 2/20 | 0.48 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11004234 | 0.93 | ALOX15 (0.61) | ALOX15IGF1RALDH1A1GAAGFER | |
| SCHEMBL11004150 | 0.93 | ALOX15 (0.61) | ALOX15IGF1RALDH1A1GAAGFER | |
| SCHEMBL31484728 | 0.91 | ALDH1A1 (0.53) | ALOX15IGF1RALDH1A1GAAGFER | |
| SCHEMBL9008919 | 0.91 | ALDH1A1 (0.53) | ALOX15IGF1RALDH1A1GAAGFER | |
| SCHEMBL17733206 | 0.88 | ALOX15 (0.50) | ALOX15IGF1RALDH1A1GAAGFER | |
| SCHEMBL76664 | 0.88 | SKP2 (0.59) | ALOX15IGF1RALDH1A1GAAGFER | |
| SCHEMBL19303094 | 0.88 | ALOX15 (0.50) | ALOX15IGF1RALDH1A1GAAGFER | |
| SCHEMBL1256802 | 0.86 | KAT8 (0.57) | ALOX15IGF1RALDH1A1KDM4EHSD17B10 | |
| SCHEMBL12494810 | 0.86 | IGF1R (0.53) | ALOX15IGF1RALDH1A1GAAGFER | |
| Hydrochloric Acid SCHEMBL10824675 | 0.85 | IGF1R (0.52) | ALOX15IGF1RALDH1A1GAAGFER |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 338 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2011842-B1 | PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF | PI R & D CO LTD (JP) | 2014-02-26 | — | — | EP | claimed |
| US-8449978-B2 | Insulated wire and insulating varnish used therefor | HITACHI CABLE, LTD. (JP) | 2013-05-28 | — | — | US | claimed |
| US-8349537-B2 | Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof | PI R&D CO., LTD. (JP) | 2013-01-08 | — | — | US | claimed |
| US-20110111351-A1 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof | WIN MAW SOE | 2011-05-12 | — | — | US | claimed |
| US-20090186295-A1 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof | PI R&D CO., LTD. (JP) | 2009-07-23 | — | — | US | claimed |
| EP-2011842-A1 | PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF | PI R & D Co., Ltd. (JP) | 2009-01-07 | — | — | EP | claimed |
| EP-1262509-B1 | IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME | PI R & D CO LTD (JP) | 2007-01-10 | — | — | EP | claimed |
| US-6890626-B1 | Imide-benzoxazole polycondensate and process for producing the same | PI R&D CO., LTD. (JP) | 2005-05-10 | — | — | US | claimed |
| EP-1262509-A1 | IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME | PI R & D Co., Ltd. (JP) | 2002-12-04 | — | — | EP | claimed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260092142-A1 | RESIN COMPOSITION, CURED PRODUCT, SCINTILLATOR PANEL, AND INDUCTOR | TORAY INDUSTRIES, INC. (JP) | 2026-04-02 | — | — | US | disclosed |
| EP-4704142-A1 | LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Toray Industries, Inc. (JP) | 2026-03-04 | — | — | EP | disclosed |
| US-12547074-B2 | Photosensitive resin composition, method for producing patterned cured film, patterned cured film and semiconductor element | RESONAC CORPORATION (JP) | 2026-02-10 | — | — | US | disclosed |
| US-12545784-B2 | Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2026-02-10 | — | — | US | disclosed |
| US-6365306-B2 | ADDING A DISSOLUTION INHIBITOR TO A POLYMER SOLUBLE IN AN AQUEOUS ALKALINE DEVELOPER AND A QUINONEDIAZIDE PHOTOSENSITIZER TO INCREASE THE SOLUBILITY DIFFERENCE BETWEEN THE EXPOSED AND UNEXPOSED PARTS; FINENESS; RESOLUTION; FILMS | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. | 2002-04-02 | — | — | US | disclosed |
| EP-1132773-A1 | POSITIVE-TYPE PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2001-09-12 | — | — | EP | disclosed |
| US-20010009746-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | NUNOMURA MASATAKA (JP) | 2001-07-26 | — | — | US | disclosed |
| US-6232032-B1 | MIXTURE OF POLYBENZOXAZOLE AND POLYAMIDE | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. | 2001-05-15 | — | — | US | disclosed |
| EP-0961169-A1 | Photosensitive polymer composition, method for forming relief patterns, and electronic parts | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 1999-12-01 | — | — | EP | disclosed |
| EP-0863436-A1 | Heat resistant photosensitive polymer composition, process for forming pattern and semiconductor device | HITACHI CHEMICAL CO., LTD. (JP) | 1998-09-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | ALOX15 2472/4885IGF1R 1757/4885ALDH1A1 3316/4885 |
| US-12545784-B2 | Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device | ASIC1, ASIC3, TET3 | ALOX15 2574/4885IGF1R 3704/4885ALDH1A1 3308/4885 |
| US-20260092142-A1 | RESIN COMPOSITION, CURED PRODUCT, SCINTILLATOR PANEL, AND INDUCTOR | PTGER1, RPTOR, LCP1 | ALOX15 2418/4885IGF1R 3169/4885ALDH1A1 3609/4885 |
| US-12547074-B2 | Photosensitive resin composition, method for producing patterned cured film, patterned cured film and semiconductor element | JMJD6, RARA, BCR | ALOX15 2728/4885IGF1R 2978/4885ALDH1A1 875/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.