Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS1 | P29475 | 2/20 | 0.36 |
| ▸ | NOS3 | P29474 | 1/20 | 0.36 |
| ▸ | NOS2 | P35228 | 1/20 | 0.36 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.34 |
| ▸ | LTA4H | P09960 | 1/20 | 0.34 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.32 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.30 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.30 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.30 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.30 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30227945 | 1.00 | NOS1 (0.36) | NOS1NOS3NOS2DGAT1LTA4H | |
| SCHEMBL12936767 | 1.00 | NOS1 (0.36) | NOS1NOS3NOS2DGAT1LTA4H | |
| Hydrochloric Acid SCHEMBL6435071 | 1.00 | NOS1 (0.36) | NOS1NOS3NOS2DGAT1LTA4H | |
| Hydrochloric Acid SCHEMBL522782 | 0.86 | MAPK1 (0.40) | NOS1NOS3NOS2LTA4HSLC7A5 | |
| Hydrochloric Acid SCHEMBL522784 | 0.86 | MAPK1 (0.40) | NOS1NOS3NOS2LTA4HSLC7A5 | |
| Hydrochloric Acid SCHEMBL318950 | 0.86 | MAPK1 (0.40) | NOS1NOS3NOS2LTA4HSLC7A5 | |
| SCHEMBL8660482 | 0.85 | DGAT1 (0.34) | NOS1NOS3NOS2DGAT1SLC7A5 | |
| SCHEMBL17643740 | 0.84 | NOS1 (0.38) | NOS1NOS3NOS2DGAT1LTA4H | |
| SCHEMBL17630153 | 0.84 | NOS1 (0.38) | NOS1NOS3NOS2DGAT1LTA4H | |
| SCHEMBL522812 | 0.83 | MAPK1 (0.41) | NOS1NOS3NOS2DGAT1LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150266920-A1 | MACROCYCLIC KETOAMIDE IMMUNOPROTEASOME INHIBITORS | HOFFMANN-LA ROCHE INC. | 2015-09-24 | — | — | US | disclosed |
| EP-2906582-A1 | MACROCYCLIC KETOAMIDE IMMUNOPROTEASOME INHIBITORS | F. Hoffmann-La Roche AG (CH) | 2015-08-19 | — | — | EP | disclosed |
| US-9085587-B2 | Inhibitors of hepatitis C virus | PRESIDIO PHARMACEUTICALS, INC. (US) | 2015-07-21 | — | — | US | disclosed |
| US-8877969-B2 | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8785104-B2 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-07-22 | — | — | US | disclosed |
| WO-2014056954-A1 | MACROCYCLIC KETOAMIDE IMMUNOPROTEASOME INHIBITORS | F. HOFFMANN-LA ROCHE AG (CH) | 2014-04-17 | — | — | WO | disclosed |
| US-20130296551-A1 | 7-MEMBERED RING COMPOUND AND METHOD OF PRODUCTION AND PHARMACEUTICAL APPLICATION THEREOF | DAIICHI SANKYO CO LTD (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20130296551-A1 | 7-MEMBERED RING COMPOUND AND METHOD OF PRODUCTION AND PHARMACEUTICAL APPLICATION THEREOF | DAIICHI SANKYO CO LTD (JP) | 2013-11-07 | — | — | US | disclosed |
| US-8507714-B2 | 7-membered ring compound and method of production and pharmaceutical application thereof | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8507714-B2 | 7-membered ring compound and method of production and pharmaceutical application thereof | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20090111047-A1 | POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090111796-A1 | 7-membered ring compound and method of production and pharmaceutical application thereof | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090087776-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090087789-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090035692-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080085468-A1 | microlithography; ultrafine processing of semiconductor using electron beam, X-ray or deep UV; high sensitivity, high resolution and good line edge roughness; suppression of vaporized outgas; a polystyrene with an acid-decomposable group; 10-tolyl-9-oxothioxanthenium nonafluorobutanesulfonate | FUJIFILM CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20080081282-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20070224540-A1 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090111796-A1 | 7-membered ring compound and method of production and pharmaceutical application thereof | CMA1, CPA3, SI | NOS1 2926/4885NOS3 1949/4885NOS2 3523/4885 |
| US-20130296551-A1 | 7-MEMBERED RING COMPOUND AND METHOD OF PRODUCTION AND PHARMACEUTICAL APPLICATION THEREOF | CMA1, CPA3, SI | NOS1 2926/4885NOS3 1949/4885NOS2 3523/4885 |
| US-20150266920-A1 | MACROCYCLIC KETOAMIDE IMMUNOPROTEASOME INHIBITORS | PSMB7, PSMC2, PSMB8 | NOS1 4031/4885NOS3 3593/4885NOS2 3985/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.