SCHEMBL27404415

SCHEMBL27404415

C=CCC(=O)Nc1ccc2c(O)cccc2c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B1 P14061 3/20 0.49
▸ HSD17B2 P37059 3/20 0.49
▸ PYGL P06737 1/20 0.46
▸ MEN1 O00255 3/20 0.44
▸ KMT2A Q03164 3/20 0.44
▸ MAPT P10636 3/20 0.44
▸ POLB P06746 1/20 0.44
▸ L3MBTL1 Q9Y468 1/20 0.44
▸ NQO2 P16083 1/20 0.42
▸ ALDH1A1 P00352 3/20 0.42
▸ CYP1A2 P05177 2/20 0.42
▸ KDM4E B2RXH2 2/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ HIF1A Q16665 1/20 0.42
▸ PLAU P00749 1/20 0.41
▸ RAB9A P51151 3/20 0.41
▸ NPC1 O15118 2/20 0.41
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ GAA P10253 1/20 0.40
▸ ROCK2 O75116 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28921916 0.80 MAPT (0.68) MEN1KMT2AMAPTPOLBL3MBTL1
SCHEMBL18403326 0.80 PYGL (0.49) HSD17B1HSD17B2PYGLMEN1KMT2A
SCHEMBL15552645 0.80 POLB (0.51) MEN1KMT2AMAPTPOLBRAB9A
SCHEMBL27404464 0.78 ALDH1A1 (0.51) HSD17B2MEN1KMT2AMAPTPOLB
SCHEMBL11594992 0.77 HSD17B1 (0.55) HSD17B1HSD17B2PYGLMEN1KMT2A
SCHEMBL11133440 0.77 NLRP3 (0.55) MEN1KMT2AMAPTALDH1A1CYP1A2
SCHEMBL1122275 0.77 HSD17B1 (0.76) HSD17B1HSD17B2PYGLMEN1KMT2A
SCHEMBL29963136 0.77 HSD17B1 (0.76) HSD17B1HSD17B2PYGLMEN1KMT2A
SCHEMBL15782656 0.75 HSD17B1 (0.57) HSD17B1HSD17B2PYGLMEN1KMT2A
SCHEMBL30726817 0.74 KCNK3 (0.60) PYGLMEN1KMT2AMAPTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240242967-A1 Polymer For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-18 — — US disclosed
EP-4390547-A1 POLYMER FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-06-26 — — EP disclosed
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