Water

Water

SCHEMBL27460201

C=CCNC=C.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29620 0.96
Hydrochloric Acid SCHEMBL2702442 0.93
SCHEMBL7827498 0.74
Water SCHEMBL1155773 0.69
SCHEMBL9600 0.69
SCHEMBL6206068 0.69
SCHEMBL13465149 0.69
SCHEMBL44721 0.69
SCHEMBL45172 0.69
SCHEMBL1567546 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105751636-B The radiation protective casing of human body safety inspection survey meter 安徽泷汇安全科技有限公司 2017-09-15 CN claimed
CN-106942219-A A kind of pesticide use emulsifier and preparation method thereof 江苏省海安石油化工厂 2017-07-14 CN claimed
CN-1597198-A Preparaction method of ni-powder MURATA MFG LTD (JP) 2005-03-23 CN claimed
CN-107849380-A Writing implement oil-based ink composition and the writing implement, marker pen and ball pen equipped with it 株式会社百乐 2018-03-27 CN disclosed
CN-107849244-A AMPHOTERIC POLYMERS AND USE IN INKJET INK COMPOSITIONS 卡博特公司 2018-03-27 CN disclosed
CN-105189686-B Puncture of tire encapsulant and use its tire patching external member 横滨橡胶株式会社 2017-11-28 CN disclosed
CN-107109402-A Compositions for reducing inhibition of nucleic acid amplification 3M创新有限公司 2017-08-29 CN disclosed
CN-107059018-A A kind of refinery's corrosion inhibiter and preparation method thereof 安徽卓远化工科技有限公司 2017-08-18 CN disclosed
CN-103313732-B Gel film containing lipid peptide type gelling agent and high-molecular compound 日产化学工业株式会社 2017-07-25 CN disclosed
CN-106459546-A Aqueous polytetrafluoroethylene dispersion 大金工业株式会社 2017-02-22 CN disclosed
CN-103797421-B Method for preparing lithographic printing plate 爱克发印艺公司 2017-02-15 CN disclosed
CN-1525516-A Plasma display panel manufacturing method for manufacturing a plasma display panel with superior picture quality, a manufacturing apparatus, and a phosphor ink ���µ�����ҵ��ʽ���� 2004-09-01 CN disclosed
CN-1523626-A Plasma display panel manufacturing method and phosphor ink coating device ���µ�����ҵ��ʽ���� 2004-08-25 CN disclosed
CN-1523627-A Plasma display panel manufacturing method and phosphor ink coating device ���µ�����ҵ��ʽ���� 2004-08-25 CN disclosed
CN-1523625-A Plasma display panel manufacturing method and phosphor ink coating device ���µ�����ҵ��ʽ���� 2004-08-25 CN disclosed
CN-1523628-A Plasma display panel manufacturing method and phosphor ink coating device ���µ�����ҵ��ʽ���� 2004-08-25 CN disclosed
CN-1146939-C Method for manufacturing plasma display panel and fluorescent ink coating device ���µ�����ҵ��ʽ���� 2004-04-21 CN disclosed
CN-1388798-A Cement admixture and cement composition NIPPON CATALYTIC CHEM IND (JP) 2003-01-01 CN disclosed
CN-1317146-A Method and apparatus for manufacturing plasma display panel suitable for manufacturing plasma display panel with good image quality, and phosphor ink MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2001-10-10 CN disclosed
CN-1103422-A Antistatic detergent glazing agent SUN HAIBO (CN) 1995-06-07 CN disclosed