SCHEMBL2746867

SCHEMBL2746867

[c]1cccc(C23CC4CC(CC(C4)C2)C3)c1Oc1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.36
GRIN2D O15399 1/20 0.33
GRIN3B O60391 1/20 0.33
GRIN1 Q05586 1/20 0.33
GRIN2A Q12879 1/20 0.33
GRIN2B Q13224 1/20 0.33
GRIN2C Q14957 1/20 0.33
GRIN3A Q8TCU5 1/20 0.33
HTT P42858 1/20 0.32
MAPK1 P28482 3/20 0.32
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
LTA4H P09960 1/20 0.31
TSHR P16473 1/20 0.31
HSD11B1 P28845 1/20 0.31
KDM1A O60341 1/20 0.31
LMNA P02545 4/20 0.31
L3MBTL1 Q9Y468 2/20 0.31
MEN1 O00255 3/20 0.30
KMT2A Q03164 3/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747159 0.81 EPHX2 (0.39) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL9509354 0.80 LMNA (0.34) EPHX2TSHRLMNAL3MBTL1MEN1
SCHEMBL7834287 0.74 HSD11B1 (0.36) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL23071351 0.73 ALDH1A1 (0.36) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL2747763 0.72 EPHX2 (0.39) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL2746865 0.71 KDM4E (0.32) LMNAMEN1KMT2AALDH1A1KDM4E
SCHEMBL23787 0.69 LMNA (0.33) LMNAMEN1KMT2AALDH1A1
SCHEMBL2747157 0.68
SCHEMBL983525 0.67 TSHR (0.44) HTTMAPK1LTA4HTSHRKDM1A
SCHEMBL11141243 0.65 LTA4H (0.42) LTA4HTSHRKMT2AKDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed