SCHEMBL2748102

SCHEMBL2748102

Nc1ccc(C2C3CC4CC(C3)CC2(c2ccc(N)c(Oc3ccccc3O)c2)C4)cc1Oc1ccccc1O

nearest known ligand 0.32

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.31
POLB P06746 1/20 0.31
GAA P10253 1/20 0.31
GFER P55789 1/20 0.31
KMT2A Q03164 1/20 0.31
ALDH1A1 P00352 2/20 0.30
LMNA P02545 1/20 0.30
KDM4E B2RXH2 1/20 0.30
MAPT P10636 1/20 0.30
HPGD P15428 1/20 0.30
TSHR P16473 1/20 0.30
ALOX12 P18054 1/20 0.30
HTT P42858 1/20 0.30
ATM Q13315 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747175 0.79 MEN1 (0.41) MEN1POLBGAAGFERKMT2A
SCHEMBL2746967 0.77 MEN1 (0.41) MEN1POLBGAAGFERKMT2A
SCHEMBL2710586 0.76 ALDH1A1 (0.44) MEN1POLBGAAGFERKMT2A
SCHEMBL2709015 0.76 HSD11B1 (0.32) MEN1POLBGAAGFERKMT2A
SCHEMBL2747640 0.73 MMP2 (0.38) MEN1POLBGAAGFERKMT2A
SCHEMBL28956093 0.73 ALDH1A1 (0.35) ALDH1A1LMNATSHR
SCHEMBL14480337 0.72 MEN1 (0.55) MEN1POLBGAAGFERKMT2A
SCHEMBL28231046 0.70 ESR1 (0.42) MEN1POLBGAAGFERKMT2A
SCHEMBL28205290 0.69 ALDH1A1 (0.53) MEN1POLBGAAGFERKMT2A
SCHEMBL2706955 0.67 ALDH1A1 (0.44) MEN1POLBGAAGFERKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed