Water

Water

SCHEMBL27488584

CCO[Si](CC)(OCC)OCC.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL39837 0.96
SCHEMBL6865192 0.93
Phosphine SCHEMBL27930495 0.93
Ammonia Solution, Strong SCHEMBL6653979 0.93
Ammonia Solution, Strong SCHEMBL27771318 0.93
SCHEMBL8415570 0.93
Hydrogen Sulfide SCHEMBL27509488 0.93
SCHEMBL31382807 0.93
Ammonia Solution, Strong SCHEMBL6652532 0.90
Ammonia Solution, Strong SCHEMBL6653517 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102227653-B Method for manufacturing optical article having anti-glare properties ESSILOR INT 2015-06-03 CN disclosed
CN-103975028-A Coating composition and antireflective coating prepared therefrom SOLVAY 2014-08-06 CN disclosed
CN-102333825-B Additives for enhancing the antistatic properties of conductive polymer-based coatings ESSILOR INT 2014-02-26 CN disclosed
CN-103502889-A Photosensitive resin composition, method for forming pattern-cured film using photosensitive resin composition, and electronic component HITACHI CHEM DUPONT MICROSYS 2014-01-08 CN disclosed
CN-103408679-A Method for producing modified conjugated diene based (co)polymer, modified conjugated diene based (co)polymer, and rubber composition JSR CORP 2013-11-27 CN disclosed
CN-102056993-B Photocurable acrylic coating compositions having good adhesion properties to a subsequent coating and corresponding coated substrates ESSILOR INT 2013-10-16 CN disclosed
CN-101754984-B Method for producing modified conjugated diene polymer, and rubber composition JSR CORP 2013-08-07 CN disclosed
CN-101765632-B Rubber composition and tire using the same BRIDGESTONE CORP 2012-10-17 CN disclosed
CN-101553522-B Process for producing modified polymer, modified polymer obtained by the process, and rubber composition containing the modified polymer JSR CORP 2012-09-05 CN disclosed
CN-102639334-A Compositions and methods for producing poly-aminofunctionalized polymerization initiators and corresponding polymers BRIDGESTONE CORP 2012-08-15 CN disclosed
CN-101096564-A Paint for transparent film and transparent film coated substrate CATALYSTS & CHEM IND CO (JP) 2008-01-02 CN disclosed
CN-101089056-A Paint for transparent film and transparent film coated substrate CATALYSTS & CHEM IND CO (JP) 2007-12-19 CN disclosed
CN-101031602-A Epoxy resin composition for sealing optical semiconductor NIPPON KAYAKU KK (JP) 2007-09-05 CN disclosed
CN-1276273-C Optical element with anti-resist-film HOYA CORP (JP) 2006-09-20 CN disclosed
CN-1751385-A Organic thin film transistor element and method for manufacturing the same KONICA MINOLTA HOLDINGS INC (JP) 2006-03-22 CN disclosed
CN-1747985-A Silicon compound containing epoxy group and thermosetting resin composition NIPPON KAYAKU KK (JP) 2006-03-15 CN disclosed
CN-1196945-C Method for preparing coating composition for spectacles lens HOYA CORP (JP) 2005-04-13 CN disclosed
CN-1414398-A Optical element with anti-resist-film HOYA CORP (JP) 2003-04-30 CN disclosed
CN-1346987-A Method for preparing coating composition for spectacles lens HOYA CORP (JP) 2002-05-01 CN disclosed
CN-1291629-A Siloxane composition capable of solidifying by radiation DOW CORNING (US) 2001-04-18 CN disclosed