SCHEMBL274970

SCHEMBL274970

CSc1ccc(C(=O)C2(N3CCOCC3)CCCCC2)cc1

nearest known ligand 0.51

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.51
ALDH1A1 P00352 2/20 0.51
TSHR P16473 2/20 0.51
MAPK1 P28482 1/20 0.51
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
LMNA P02545 1/20 0.41
THRB P10828 1/20 0.41
KDM4E B2RXH2 1/20 0.40
MAPT P10636 1/20 0.40
HPGD P15428 1/20 0.38
TNF P01375 1/20 0.37
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C19 P33261 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10885964 0.93 ALDH1A1 (0.55) SMN1; SMN2ALDH1A1TSHRMAPK1MEN1
SCHEMBL727265 0.89 MEN1 (0.49) SMN1; SMN2ALDH1A1TSHRMAPK1MEN1
SCHEMBL727241 0.89 MEN1 (0.49) SMN1; SMN2ALDH1A1TSHRMAPK1MEN1
SCHEMBL18883176 0.84 CYP3A4 (0.48) SMN1; SMN2ALDH1A1MEN1KMT2ALMNA
SCHEMBL10458636 0.83 THRB (0.44) SMN1; SMN2ALDH1A1MEN1KMT2ALMNA
SCHEMBL9681734 0.83 CYP3A4 (0.54) SMN1; SMN2ALDH1A1MEN1KMT2ALMNA
SCHEMBL9680457 0.82 GSK3B (0.49) SMN1; SMN2ALDH1A1MAPK1LMNATHRB
SCHEMBL12013268 0.82 LMNA (0.43) SMN1; SMN2ALDH1A1LMNATHRBKDM4E
SCHEMBL10458802 0.82 ATM (0.43) SMN1; SMN2ALDH1A1MEN1KMT2ALMNA
SCHEMBL9679446 0.82 MAPT (0.47) SMN1; SMN2ALDH1A1MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2585431-B1 METAL FREE BLEACHING COMPOSITION BASF SE (DE) 2017-09-06 EP disclosed
EP-2585431-B1 METAL FREE BLEACHING COMPOSITION BASF SE (DE) 2017-09-06 EP disclosed
US-9657435-B2 Metal free bleaching composition BASF SE (DE) 2017-05-23 US disclosed
US-9657435-B2 Metal free bleaching composition BASF SE (DE) 2017-05-23 US disclosed
US-9657435-B2 Metal free bleaching composition BASF SE (DE) 2017-05-23 US disclosed
CN-102958909-B metal-free bleaching compositions 巴斯夫欧洲公司 2016-11-09 CN disclosed
EP-1403710-B1 Polymerizable composition FUJIFILM CORP (JP) 2015-06-10 EP disclosed
EP-2085220-B1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same FUJIFILM CORP (JP) 2015-05-20 EP disclosed
US-8822126-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2014-09-02 US disclosed
US-8822126-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2014-09-02 US disclosed
US-20070231740-A1 A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
US-20070231740-A1 A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
US-20070231737-A1 polymer having a carbon-carbon unsaturated bond in then chain and a side chain; butadiene-styrene copolymer; thick layer efficiently engraved with low laser energy; sensitivity FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
EP-1839853-A1 Planographic printing plate precursor and stack thereof FUJIFILM Corporation (JP) 2007-10-03 EP disclosed
US-20070072113-A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070072113-A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-5145885-A Morpholine compound, binders CIBA-GEIGY CORPORATION (US) 1992-09-08 US disclosed
US-4992547-A Aminoaryl ketone photoinitiators CIBA-GEIGY CORPORATION (US) 1991-02-12 US disclosed