SCHEMBL27660686

SCHEMBL27660686

CC(=O)O[SiH2]CC(c1ccccc1)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 1/20 0.43
MTNR1B P49286 1/20 0.43
ALDH1A1 P00352 2/20 0.42
CYP3A4 P08684 1/20 0.42
KMT2A Q03164 1/20 0.40
HPGD P15428 2/20 0.38
CYP2D6 P10635 2/20 0.38
LMNA P02545 2/20 0.38
POLB P06746 1/20 0.38
SRC P12931 1/20 0.38
TSHR P16473 1/20 0.38
PABPC1 P11940 1/20 0.37
APOBEC3A P31941 1/20 0.37
APOBEC3G Q9HC16 1/20 0.37
TRPA1 O75762 1/20 0.37
CYP1A2 P05177 1/20 0.37
PKM P14618 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
CHRM2 P08172 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL705544 0.74 HTR2A (0.41) CYP3A4KMT2AHPGDCYP2D6LMNA
SCHEMBL4342731 0.73 ALDH1A1 (0.52) ALDH1A1LMNATSHRPKMSMN1; SMN2
SCHEMBL706629 0.73 ALDH1A1 (0.44) MTNR1AMTNR1BALDH1A1CYP3A4KMT2A
SCHEMBL704363 0.71 TAAR1 (0.39) ALDH1A1CYP3A4KMT2ACYP2D6LMNA
SCHEMBL9601863 0.71 ALDH1A1 (0.53) MTNR1AMTNR1BALDH1A1CYP3A4KMT2A
SCHEMBL708761 0.71 HTR2A (0.39) HPGDLMNAPOLBTSHRTRPA1
SCHEMBL27157805 0.70 HTR2A (0.41) TSHR
SCHEMBL706548 0.69 HRH1 (0.39) CYP3A4KMT2ALMNATSHRCYP1A2
SCHEMBL18662231 0.68 HTR2A (0.39) CYP2D6LMNATSHRCYP1A2SMN1; SMN2
SCHEMBL702495 0.68 SCN4A (0.39) KMT2ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100535054-C Silica film forming material, silica film and preparation method thereof FUJITSU LTD (JP) 2009-09-02 CN disclosed
CN-1891757-A Silica film forming material, silica film and method of manufacturing the same FUJITSU LTD (JP) 2007-01-10 CN disclosed