SCHEMBL27743554

SCHEMBL27743554

C=CC(=O)O[Si](C)(OC(C)=O)OC(=O)CC

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.34
HPGD P15428 1/20 0.34
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2579460 0.87 ALDH1A1 (0.38) TSHRHPGDALDH1A1
SCHEMBL27609652 0.79 TSHR (0.39) TSHRHPGDALDH1A1
SCHEMBL10592974 0.79 TSHR (0.39) TSHRHPGDALDH1A1
SCHEMBL431579 0.77 ALDH1A1 (0.39) TSHRHPGDALDH1A1
SCHEMBL2583601 0.72 TSHR (0.39) TSHRHPGDALDH1A1
SCHEMBL7195048 0.71 LMNA (0.38) HPGDALDH1A1
SCHEMBL63651 0.69 ALDH1A1 (0.41) TSHRALDH1A1
SCHEMBL27806782 0.69 TSHR (0.46) TSHRHPGDALDH1A1
SCHEMBL2584602 0.69 TSHR (0.35) TSHRHPGDALDH1A1
SCHEMBL10820885 0.69 ALDH1A1 (0.35) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101639628-B Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element JSR CORP JP 2013-04-03 CN disclosed
CN-101324755-B Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof JSR CORP 2012-10-03 CN disclosed
CN-101639628-A Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element JSR CORP JP 2010-02-03 CN disclosed
CN-101515113-A Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same JSR CORP (JP) 2009-08-26 CN disclosed
CN-101324755-A Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof JSR CORP (JP) 2008-12-17 CN disclosed