SCHEMBL28029593

SCHEMBL28029593

COS(=O)(=O)Cc1ccncc1

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
HSD17B10 Q99714 1/20 0.41
SMN1; SMN2 Q16637 7/20 0.40
HTT P42858 5/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 1/20 0.40
HPGD P15428 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
NPC1 O15118 1/20 0.40
LMNA P02545 6/20 0.39
LOXL2 Q9Y4K0 1/20 0.38
RAB9A P51151 2/20 0.37
NR2F2 P24468 2/20 0.37
PTPRB P23467 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29052387 0.80 LMNA (0.42) ALDH1A1SMN1; SMN2HTTKMT2AMAPT
SCHEMBL260820 0.78 KMT2A (0.61) ALDH1A1HTTKMT2AHPGD
SCHEMBL28509967 0.77 CA2 (0.47) ALDH1A1CYP2C19SMN1; SMN2HTTKMT2A
Hydrochloric Acid SCHEMBL28137631 0.77 KMT2A (0.59) ALDH1A1HTTKMT2AHPGD
SCHEMBL14370973 0.77 CA1 (0.47) ALDH1A1CYP2C19SMN1; SMN2KMT2ALMNA
SCHEMBL2101858 0.76 L3MBTL1 (0.43) ALDH1A1CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL29201427 0.75 KMT2A (0.31) KMT2A
SCHEMBL28507796 0.75 CALM1 (0.41) KMT2A
SCHEMBL11516659 0.75 L3MBTL1 (0.46) ALDH1A1HSD17B10HTTKMT2AMAPT
SCHEMBL28771805 0.75 TXNRD1 (0.44) ALDH1A1KMT2AL3MBTL1LOXL2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104903320-B Nitrogen-containing heterocycle compound or its salt 富士胶片株式会社 2018-11-13 CN disclosed
CN-104903320-A Nitrogen-containing heterocylic compound or salt thereof FUJIFILM CORP 2015-09-09 CN disclosed